SCHEMBL25916428

SCHEMBL25916428

C=C(C)C(=O)OCCCS(=O)(=O)ON1C(=O)c2ccccc2C1=O

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ HTT P42858 3/20 0.41
▸ POLB P06746 1/20 0.41
▸ APEX1 P27695 1/20 0.41
▸ TDP1 Q9NUW8 1/20 0.41
▸ VDR P11473 2/20 0.40
▸ ALDH1A1 P00352 9/20 0.40
▸ MAPT P10636 7/20 0.40
▸ KDM4E B2RXH2 6/20 0.40
▸ KMT2A Q03164 5/20 0.40
▸ F2 P00734 4/20 0.40
▸ HPGD P15428 3/20 0.40
▸ TSHR P16473 2/20 0.38
▸ MEN1 O00255 2/20 0.38
▸ XBP1 P17861 2/20 0.38
▸ CYP1A2 P05177 2/20 0.38
▸ CYP3A4 P08684 1/20 0.38
▸ CYP2C19 P33261 1/20 0.38
▸ NPSR1 Q6W5P4 1/20 0.38
▸ LMNA P02545 1/20 0.38
▸ SMN1; SMN2 Q16637 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25915966 0.79 ALDH1A1 (0.41) HTTVDRALDH1A1MAPTKDM4E
SCHEMBL13515784 0.78 GAA (0.57) HTTPOLBAPEX1TDP1ALDH1A1
SCHEMBL9839694 0.77 SMN1; SMN2 (0.54) HTTALDH1A1MAPTKMT2AHPGD
SCHEMBL11028745 0.76 ALDH1A1 (0.52) HTTTDP1VDRALDH1A1MAPT
SCHEMBL27490029 0.76 TDP1 (0.52) HTTPOLBAPEX1TDP1KMT2A
SCHEMBL12581019 0.75 ALDH1A1 (0.40) HTTVDRALDH1A1MAPTKDM4E
SCHEMBL11199907 0.74 KDM4E (0.51) HTTTDP1VDRALDH1A1MAPT
SCHEMBL10411526 0.74 MAPT (0.47) HTTPOLBTDP1VDRALDH1A1
SCHEMBL11025672 0.73 KDM4E (0.50) HTTTDP1VDRALDH1A1MAPT
SCHEMBL210721 0.73 SMN1; SMN2 (0.60) POLBAPEX1TDP1ALDH1A1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230221640-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-07-13 — — US disclosed
US-20230221640-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-07-13 — — US disclosed
Send feedback