SCHEMBL25916976

SCHEMBL25916976

CO[Si](CCC1CC(C)C(CC[Si](OC)(OC)OC)C1)(OC)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25917083 0.88
SCHEMBL9098574 0.88 LMNA (0.31)
SCHEMBL25917084 0.86
SCHEMBL8001617 0.81 LMNA (0.33)
SCHEMBL25916975 0.81 LMNA (0.38)
SCHEMBL167229 0.77
SCHEMBL27191212 0.73 LMNA (0.32)
SCHEMBL8166454 0.72
SCHEMBL28749961 0.72
SCHEMBL7954394 0.72 LMNA (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11873415-B2 Substrate with water repellent oil repellent layer, vapor deposition material, and method for producing substrate with water repellent oil repellent layer AGC Inc. (JP) 2024-01-16 US disclosed
US-20230220236-A1 COMPOSITION, SUBSTRATE WITH SURFACE LAYER, METHOD FOR PRODUCING SUBSTRATE WITH SURFACE LAYER, COMPOUNDS, AND METHODS FOR PRODUCING COMPOUNDS AGC Inc. (JP) 2023-07-13 US disclosed