SCHEMBL25918565

SCHEMBL25918565

C=C(C)C(=O)OCCCOCCCc1cccs1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.52
SMN1; SMN2 Q16637 4/20 0.52
ALDH1A1 P00352 3/20 0.52
POLB P06746 2/20 0.52
L3MBTL1 Q9Y468 2/20 0.52
NPC1 O15118 4/20 0.48
THRB P10828 1/20 0.42
TDP1 Q9NUW8 2/20 0.41
APEX1 P27695 1/20 0.41
HTT P42858 1/20 0.41
RAB9A P51151 3/20 0.39
MAPT P10636 2/20 0.39
TAAR1 Q96RJ0 1/20 0.38
KDM4E B2RXH2 1/20 0.38
MEN1 O00255 1/20 0.38
CYP1A2 P05177 1/20 0.38
CYP3A4 P08684 1/20 0.38
CYP2D6 P10635 1/20 0.38
CYP2C9 P11712 1/20 0.38
HPGD P15428 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28093241 0.89 NPC1 (0.56) TSHRSMN1; SMN2ALDH1A1POLBL3MBTL1
SCHEMBL28093005 0.89 NPC1 (0.56) TSHRSMN1; SMN2ALDH1A1POLBL3MBTL1
SCHEMBL28093240 0.89 NPC1 (0.56) TSHRSMN1; SMN2ALDH1A1POLBL3MBTL1
SCHEMBL28050476 0.89 NPC1 (0.56) TSHRSMN1; SMN2ALDH1A1POLBL3MBTL1
SCHEMBL9075962 0.86 MAPT (0.47) TSHRSMN1; SMN2ALDH1A1POLBL3MBTL1
SCHEMBL10886447 0.78 LMNA (0.54) TSHRSMN1; SMN2ALDH1A1POLBNPC1
SCHEMBL25306776 0.78 TAAR1 (0.59) TSHRSMN1; SMN2ALDH1A1POLBL3MBTL1
SCHEMBL8295298 0.77 NPC1 (0.51) TSHRSMN1; SMN2ALDH1A1POLBL3MBTL1
SCHEMBL5702882 0.76 TSHR (0.64) TSHRALDH1A1POLBTHRBTDP1
SCHEMBL10314654 0.76 TSHR (0.64) TSHRALDH1A1POLBTHRBTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230221640-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-07-13 US disclosed