SCHEMBL25933475

SCHEMBL25933475

Cc1cc(C(c2ccc(C(=O)O)cc2)(C(F)(F)F)C(F)(F)F)ccc1OC=O

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MRGPRX4 Q96LA9 5/20 0.43
RXRA P19793 4/20 0.40
RXRB P28702 3/20 0.40
RXRG P48443 3/20 0.40
SRD5A2 P31213 2/20 0.40
RAB9A P51151 2/20 0.38
KDM4E B2RXH2 1/20 0.38
ALDH1A1 P00352 1/20 0.38
GAA P10253 1/20 0.38
TSHR P16473 1/20 0.38
LMNA P02545 1/20 0.37
MAPK1 P28482 1/20 0.37
HTT P42858 1/20 0.37
RARA P10276 1/20 0.36
RARB P10826 1/20 0.36
RARG P13631 1/20 0.36
CA12 O43570 1/20 0.36
CA1 P00915 1/20 0.36
CA2 P00918 1/20 0.36
CA4 P22748 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25933480 0.86 RXRA (0.43) RXRARXRBRXRGSRD5A2RAB9A
SCHEMBL5582063 0.82 RXRA (0.51) MRGPRX4RXRARXRBRXRGSRD5A2
SCHEMBL25933478 0.82 RXRA (0.39) MRGPRX4RXRARXRBRXRGSRD5A2
SCHEMBL10020264 0.81 TSHR (0.51) MRGPRX4RAB9AKDM4EALDH1A1GAA
SCHEMBL17084443 0.80 SRD5A2 (0.46) RXRARXRBRXRGSRD5A2ALDH1A1
SCHEMBL336470 0.77 SRD5A2 (0.61) RXRARXRBRXRGSRD5A2ALDH1A1
Hydrochloric Acid SCHEMBL19837805 0.75 SRD5A2 (0.59) RXRARXRBRXRGSRD5A2ALDH1A1
Hydrochloric Acid SCHEMBL8505603 0.75 SRD5A2 (0.59) RXRARXRBRXRGSRD5A2ALDH1A1
SCHEMBL16522345 0.74 ALDH1A1 (0.43) MRGPRX4KDM4EALDH1A1
SCHEMBL9742053 0.72 RXRA (0.59) RXRARXRBRXRGSRD5A2KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230244148-A1 EUV RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2023-08-03 US disclosed