SCHEMBL25946704

SCHEMBL25946704

CC(CC(=O)O)OC(=O)CI

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MMP1 P03956 1/20 0.39
MMP2 P08253 1/20 0.39
MMP3 P08254 1/20 0.39
MMP9 P14780 1/20 0.39
MMP13 P45452 1/20 0.39
ALOX15 P16050 1/20 0.34
SLC22A6 Q4U2R8 1/20 0.33
CACNA2D1 P54289 2/20 0.32
SMN1; SMN2 Q16637 2/20 0.32
LMNA P02545 2/20 0.32
CACNB3 P54284 1/20 0.32
CACNA1C Q13936 1/20 0.32
PGR P06401 1/20 0.32
ADRA1A P35348 1/20 0.32
HTR2B P41595 1/20 0.32
CACNA2D2 Q9NY47 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
CYP1A2 P05177 3/20 0.31
PRKCA P17252 1/20 0.31
MAPT P10636 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25946703 0.83 MMP1 (0.39) MMP1MMP2MMP3MMP9MMP13
SCHEMBL29124665 0.82 CYP1A2 (0.40) MMP1MMP2MMP3MMP9MMP13
SCHEMBL4361342 0.80 MMP1 (0.36) MMP1MMP2MMP3MMP9MMP13
SCHEMBL13576868 0.80 MMP1 (0.55) MMP1MMP2MMP3MMP9MMP13
SCHEMBL2738372 0.80 FFAR3 (0.39) MMP1MMP2MMP3MMP9MMP13
SCHEMBL14359573 0.79
SCHEMBL2526939 0.78 CYP1A2 (0.49) LMNACYP1A2MAPTMAPK1MEN1
SCHEMBL1125336 0.78 MMP1 (0.39) MMP1MMP2MMP3MMP9MMP13
SCHEMBL34471150 0.78 MMP1 (0.39) MMP1MMP2MMP3MMP9MMP13
SCHEMBL7815191 0.78 MMP1 (0.35) MMP1MMP2MMP3MMP9MMP13

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240027902-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-25 US disclosed
US-11720020-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-08 US disclosed