SCHEMBL25946808

SCHEMBL25946808

O=C(O)COC(=O)CCBr

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PAM P19021 3/20 0.52
TSHR P16473 3/20 0.36
CTH P32929 1/20 0.36
CBS P35520 1/20 0.36
THPO P40225 1/20 0.36
THRB P10828 1/20 0.35
ALDH1A1 P00352 2/20 0.32
TRPA1 O75762 1/20 0.32
LMNA P02545 3/20 0.32
ALKBH5 Q6P6C2 1/20 0.32
SUCNR1 Q9BXA5 1/20 0.32
EGLN1 Q9GZT9 1/20 0.32
TDP1 Q9NUW8 2/20 0.31
MEN1 O00255 2/20 0.31
HPGD P15428 2/20 0.31
KMT2A Q03164 2/20 0.31
KDM4E B2RXH2 1/20 0.31
USP2 O75604 1/20 0.31
CYP3A4 P08684 1/20 0.31
HSD17B10 Q99714 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL94604 0.84 PAM (0.60) PAMTSHRCTHCBSTHPO
SCHEMBL11763865 0.81 PAM (0.58) PAMTSHRCTHCBSTHPO
SCHEMBL530330 0.79 PAM (0.56) PAMTSHRCTHCBSTHPO
SCHEMBL9333897 0.79
SCHEMBL1845834 0.79 PAM (0.75) PAMTSHRCTHCBSTHPO
SCHEMBL11388232 0.77 PAM (0.54) PAMTSHRCTHCBSTHPO
SCHEMBL5953831 0.77 PAM (0.54) PAMTSHRCTHCBSTHPO
SCHEMBL1690888 0.77 PAM (0.54) PAMTSHRCTHCBSTHPO
Ammonia Solution, Strong SCHEMBL11544660 0.77 PAM (0.54) PAMTSHRCTHCBSTHPO
SCHEMBL10353138 0.77 PAM (0.54) PAMTSHRCTHCBSTHPO

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240027902-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-25 US disclosed
US-11720020-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-08 US disclosed
US-11720020-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-08 US disclosed