SCHEMBL25960281

SCHEMBL25960281

CN(C(=O)OC(C)(C)C)c1ccc(C[SiH3])cc1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PAX8 Q06710 1/20 0.49
BRD4 O60885 2/20 0.40
CREBBP Q92793 1/20 0.40
LMNA P02545 2/20 0.38
NR1H4 Q96RI1 1/20 0.38
NPSR1 Q6W5P4 2/20 0.37
MEN1 O00255 1/20 0.37
RAB9A P51151 1/20 0.37
KMT2A Q03164 1/20 0.37
MT-CO2 P00403 1/20 0.36
NR1H3 Q13133 3/20 0.36
GAA P10253 1/20 0.36
MAPK1 P28482 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
TSHR P16473 1/20 0.36
NOTUM Q6P988 1/20 0.36
HTT P42858 1/20 0.35
CHRNB2 P17787 2/20 0.35
CHRNB4 P30926 2/20 0.35
CHRNA3 P32297 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25960283 0.88 PAX8 (0.47) PAX8BRD4CREBBPLMNANR1H4
SCHEMBL25960318 0.86 LMNA (0.39) PAX8BRD4CREBBPLMNANR1H4
SCHEMBL8018111 0.86 PAX8 (0.55) PAX8BRD4CREBBPLMNANPSR1
SCHEMBL7531272 0.85 PAX8 (0.50) PAX8BRD4CREBBPLMNANR1H4
SCHEMBL16197281 0.85 PAX8 (0.50) PAX8BRD4CREBBPLMNANR1H4
SCHEMBL25960268 0.85 PAX8 (0.45) PAX8BRD4CREBBPLMNANR1H4
SCHEMBL16856539 0.84 PAX8 (0.49) PAX8BRD4CREBBPLMNANR1H4
SCHEMBL13674397 0.84 PAX8 (0.49) PAX8BRD4CREBBPLMNANR1H4
SCHEMBL14090333 0.84 PAX8 (0.49) PAX8BRD4CREBBPLMNANR1H4
SCHEMBL4615305 0.83 NR1H4 (0.56) PAX8BRD4CREBBPLMNANR1H4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230244149-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-03 US disclosed