SCHEMBL25960285

SCHEMBL25960285

CCN(CCC[SiH3])C(=O)OC(C)(C)CC

nearest known ligand 0.37

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
CA14 Q9ULX7 1/20 0.37
CA12 O43570 1/20 0.33
CA1 P00915 1/20 0.33
CA9 Q16790 1/20 0.33
LMNA P02545 1/20 0.31
MEN1 O00255 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25960286 0.89 CA14 (0.39) CA14CA12CA1CA9
SCHEMBL25960287 0.89 CA14 (0.39) CA14CA12CA1CA9
SCHEMBL25960249 0.86 CA14 (0.45) CA14CA12CA1CA9LMNA
SCHEMBL25960297 0.82 MEN1 (0.33) CA14LMNAMEN1KMT2A
SCHEMBL25960284 0.81
SCHEMBL25960295 0.80 CA12 (0.39) CA14CA12CA1CA9
SCHEMBL25960289 0.79 HDAC1 (0.43) LMNA
SCHEMBL1850676 0.76 CA14 (0.45) CA14CA12CA1CA9
SCHEMBL1850491 0.76 CA14 (0.45) CA14CA12CA1CA9
SCHEMBL1850140 0.76 CA14 (0.45) CA14CA12CA1CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230244149-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-03 US disclosed