SCHEMBL25960286

SCHEMBL25960286

CCCN(CCC[SiH3])C(=O)OC(C)(C)CC

nearest known ligand 0.39

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
CA14 Q9ULX7 2/20 0.39
CA12 O43570 3/20 0.32
CA9 Q16790 2/20 0.32
CA2 P00918 1/20 0.32
SRD5A1 P18405 1/20 0.31
CA1 P00915 2/20 0.31
TSHR P16473 1/20 0.31
MAPK1 P28482 1/20 0.31
CA7 P43166 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25960287 0.94 CA14 (0.39) CA14CA12CA9CA1
SCHEMBL25960285 0.89 CA14 (0.37) CA14CA12CA9CA1
SCHEMBL25960250 0.87 CA14 (0.48) CA14CA12CA9CA2CA1
SCHEMBL25960294 0.85 CA12 (0.35) CA14CA12CA9CA2SRD5A1
SCHEMBL25960295 0.82 CA12 (0.39) CA14CA12CA9CA2CA1
SCHEMBL1850140 0.81 CA14 (0.45) CA14CA12CA9CA2CA1
SCHEMBL14802529 0.81 CA14 (0.45) CA14CA12CA9CA2CA1
SCHEMBL1850491 0.81 CA14 (0.45) CA14CA12CA9CA2CA1
SCHEMBL1850676 0.81 CA14 (0.45) CA14CA12CA9CA2CA1
SCHEMBL25960284 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230244149-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-03 US disclosed