Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 2/20 | 0.35 |
| ▸ | CA2 | P00918 | 1/20 | 0.35 |
| ▸ | CA9 | Q16790 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.33 |
| ▸ | CA1 | P00915 | 1/20 | 0.33 |
| ▸ | CA7 | P43166 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | TP53 | P04637 | 1/20 | 0.31 |
| ▸ | SRD5A1 | P18405 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25960295 | 0.90 | CA12 (0.39) | CA12CA2CA9CA14CA1 | |
| SCHEMBL25960297 | 0.85 | MEN1 (0.33) | TSHRCA14ALDH1A1 | |
| SCHEMBL25960258 | 0.85 | CA12 (0.41) | CA12CA2CA9TSHRMAPK1 | |
| SCHEMBL25960286 | 0.85 | CA14 (0.39) | CA12CA2CA9TSHRMAPK1 | |
| SCHEMBL25960287 | 0.78 | CA14 (0.39) | CA12CA9CA14CA1ALDH1A1 | |
| SCHEMBL25960285 | 0.76 | CA14 (0.37) | CA12CA9CA14CA1 | |
| SCHEMBL25960296 | 0.76 | ALDH1A1 (0.31) | TSHRALDH1A1 | |
| SCHEMBL14802529 | 0.75 | CA14 (0.45) | CA12CA2CA9CA14CA1 | |
| SCHEMBL1850140 | 0.75 | CA14 (0.45) | CA12CA2CA9CA14CA1 | |
| SCHEMBL1850676 | 0.75 | CA14 (0.45) | CA12CA2CA9CA14CA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230244149-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-08-03 | — | — | US | disclosed |