SCHEMBL25969185

SCHEMBL25969185

Cc1ccc(Oc2ccc(C(c3ccc(Oc4ccc(N5C(=O)c6ccc(Oc7ccc(C(c8ccc(Oc9ccc%10c(c9)C(=O)N(C)C%10=O)cc8)(C(F)(F)F)C(F)(F)F)cc7)cc6C5=O)cc4)cc3)(C(F)(F)F)C(F)(F)F)cc2)cc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 6/20 0.52
KMT2A Q03164 6/20 0.52
BRD4 O60885 1/20 0.47
PKM P14618 1/20 0.46
NPSR1 Q6W5P4 2/20 0.46
MAPT P10636 1/20 0.46
TDP1 Q9NUW8 1/20 0.46
ALDH1A1 P00352 4/20 0.44
NPC1 O15118 1/20 0.44
TSHR P16473 1/20 0.44
CASP1 P29466 1/20 0.44
RAB9A P51151 1/20 0.44
CASP7 P55210 1/20 0.44
HSD17B10 Q99714 1/20 0.44
LPAR1 Q92633 1/20 0.44
LPAR3 Q9UBY5 1/20 0.44
GAA P10253 2/20 0.43
HTT P42858 1/20 0.42
CA9 Q16790 4/20 0.41
CA12 O43570 3/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25969188 1.00 MEN1 (0.52) MEN1KMT2ABRD4PKMNPSR1
SCHEMBL14106915 0.96 BRD4 (0.50) MEN1KMT2ABRD4PKMNPSR1
SCHEMBL25969156 0.96 MEN1 (0.48) MEN1KMT2ABRD4PKMNPSR1
SCHEMBL1104522 0.95 MEN1 (0.46) MEN1KMT2ABRD4PKMNPSR1
SCHEMBL30829232 0.94 MEN1 (0.47) MEN1KMT2ABRD4PKMNPSR1
SCHEMBL1962793 0.94 MEN1 (0.47) MEN1KMT2ABRD4PKMNPSR1
SCHEMBL12204981 0.92 MEN1 (0.44) MEN1KMT2ABRD4PKMNPSR1
SCHEMBL12009338 0.90 MEN1 (0.44) MEN1KMT2ABRD4PKMNPSR1
SCHEMBL15744784 0.88 BRD4 (0.48) MEN1KMT2ABRD4PKMNPSR1
SCHEMBL1960350 0.88 ALDH1A1 (0.50) MEN1KMT2AMAPTALDH1A1NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230260787-A1 COMPOSITION FOR FORMING PROTECTIVE FILM AGAINST ALKALINE AQUEOUS HYDROGEN PEROXIDE, SUBSTRATE FOR PRODUCING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING PROTECTIVE FILM, AND METHOD FOR FORMING PATTERN SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-17 US disclosed