SCHEMBL25969601

SCHEMBL25969601

c1ccc(Oc2ccc3ccccc3c2-c2c(Oc3ccccc3)ccc3ccccc23)cc1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 2/20 0.61
TSHR P16473 2/20 0.46
ALDH1A1 P00352 2/20 0.46
HSD17B10 Q99714 2/20 0.46
CYP2A6 P11509 1/20 0.46
TDP1 Q9NUW8 1/20 0.46
LTA4H P09960 1/20 0.46
KMT2A Q03164 2/20 0.45
KDM4E B2RXH2 1/20 0.45
GLA P06280 1/20 0.45
WDR5 P61964 1/20 0.44
KCNA3 P22001 1/20 0.43
HPRT1 P00492 1/20 0.42
CYP1A2 P05177 1/20 0.40
CYP3A4 P08684 1/20 0.40
CYP2C9 P11712 1/20 0.40
CYP2C19 P33261 1/20 0.40
LMNA P02545 1/20 0.39
GAA P10253 1/20 0.39
HIF1A Q16665 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28480400 0.92 MAPT (0.53) MAPTTSHRALDH1A1HSD17B10CYP2A6
SCHEMBL7261510 0.84 MAPT (0.53) MAPTTSHRALDH1A1HSD17B10CYP2A6
SCHEMBL16891251 0.84 MAPT (0.49) MAPTTSHRALDH1A1HSD17B10CYP2A6
SCHEMBL1052575 0.83 MAPT (0.52) MAPTTSHRALDH1A1HSD17B10CYP2A6
SCHEMBL7257192 0.83 MAOA (0.53) MAPTTSHRALDH1A1HSD17B10TDP1
SCHEMBL6359590 0.82 SRD5A2 (0.53) MAPTKMT2AKDM4EWDR5CYP1A2
SCHEMBL30730017 0.82 SRD5A2 (0.53) MAPTKMT2AKDM4EWDR5CYP1A2
SCHEMBL9319668 0.82 PTPN22 (0.50) MAPTHSD17B10CYP1A2CYP2C9CYP2C19
SCHEMBL10978313 0.82 NCEH1 (0.50) MAPTTSHRALDH1A1HSD17B10CYP2A6
SCHEMBL7654717 0.82 MAPT (0.46) MAPTTSHRALDH1A1HSD17B10CYP2A6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230260787-A1 COMPOSITION FOR FORMING PROTECTIVE FILM AGAINST ALKALINE AQUEOUS HYDROGEN PEROXIDE, SUBSTRATE FOR PRODUCING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING PROTECTIVE FILM, AND METHOD FOR FORMING PATTERN SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-17 US disclosed