SCHEMBL25970545

SCHEMBL25970545

CC1(C)CC(C)(c2ccc(NC(=O)c3ccccc3)cc2)c2ccccc21

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 7/20 0.51
RAB9A P51151 7/20 0.51
SMN1; SMN2 Q16637 3/20 0.51
MAPT P10636 1/20 0.51
PTPN1 P18031 2/20 0.50
CACNA1B Q00975 1/20 0.50
APBA1 Q02410 1/20 0.50
MEN1 O00255 5/20 0.49
KMT2A Q03164 5/20 0.49
ALDH1A1 P00352 2/20 0.49
POLB P06746 2/20 0.49
SIRT1 Q96EB6 1/20 0.49
KDM4E B2RXH2 1/20 0.49
TP53 P04637 1/20 0.48
GAA P10253 1/20 0.48
NFKB1 P19838 1/20 0.48
HTT P42858 1/20 0.48
NFKB2 Q00653 1/20 0.48
RELA Q04206 1/20 0.48
FSHR P23945 5/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25721424 0.85 NPC1 (0.52) NPC1RAB9ASMN1; SMN2MAPTMEN1
SCHEMBL25067754 0.81 MEN1 (0.60) NPC1RAB9ASMN1; SMN2MAPTMEN1
SCHEMBL17281437 0.80 RXRA (0.49) SMN1; SMN2MEN1KMT2ATP53GAA
SCHEMBL8776513 0.79 KMT2A (0.68) NPC1RAB9ASMN1; SMN2MAPTPTPN1
SCHEMBL9226974 0.77 MEN1 (0.44) NPC1RAB9ASMN1; SMN2MAPTMEN1
SCHEMBL503853 0.75 MEN1 (0.46) SMN1; SMN2MAPTMEN1KMT2AALDH1A1
SCHEMBL29436894 0.75 MEN1 (0.46) SMN1; SMN2MAPTMEN1KMT2AALDH1A1
SCHEMBL26327047 0.74 MEN1 (0.41) NPC1RAB9ASMN1; SMN2MAPTMEN1
Water SCHEMBL27831248 0.74 MEN1 (0.45) SMN1; SMN2MAPTMEN1KMT2AALDH1A1
SCHEMBL126415 0.73 PTPN1 (0.87) NPC1RAB9ASMN1; SMN2MAPTPTPN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230260787-A1 COMPOSITION FOR FORMING PROTECTIVE FILM AGAINST ALKALINE AQUEOUS HYDROGEN PEROXIDE, SUBSTRATE FOR PRODUCING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING PROTECTIVE FILM, AND METHOD FOR FORMING PATTERN SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-17 US disclosed