SCHEMBL25990803

SCHEMBL25990803

C=C/C=C\c1c(C)occc1=O

nearest known ligand 0.46

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.46
KDM4E B2RXH2 1/20 0.46
GAA P10253 1/20 0.35
KMT2A Q03164 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21019987 0.79 LMNA (0.50) LMNAKDM4EGAAKMT2ASMN1; SMN2
SCHEMBL19360528 0.72 ALOX5 (0.33) LMNAKDM4E
SCHEMBL24245285 0.68
SCHEMBL20243974 0.68
SCHEMBL19041295 0.66
SCHEMBL7570964 0.66
Maltol SCHEMBL23309785 0.66 KDM4E (0.95) LMNAKDM4EGAAKMT2ASMN1; SMN2
SCHEMBL18826666 0.66 KDM4E (0.36) LMNAKDM4E
SCHEMBL26535077 0.64 LMNA (0.39) LMNAKDM4EGAA
SCHEMBL25748515 0.64

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230359119-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-09 US disclosed
US-20230324798-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-12 US disclosed
US-20230259027-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-17 US disclosed