Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 3/20 | 0.53 |
| ▸ | KDM4E | B2RXH2 | 10/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.44 |
| ▸ | GAA | P10253 | 2/20 | 0.43 |
| ▸ | POLB | P06746 | 2/20 | 0.41 |
| ▸ | MEN1 | O00255 | 4/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.40 |
| ▸ | HTT | P42858 | 2/20 | 0.40 |
| ▸ | HPGD | P15428 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 1/20 | 0.40 |
| ▸ | LMNA | P02545 | 2/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21779001 | 0.90 | THRB (0.58) | THRBKDM4EALDH1A1SMN1; SMN2GAA | |
| SCHEMBL137572 | 0.90 | THRB (0.65) | THRBKDM4EALDH1A1SMN1; SMN2GAA | |
| SCHEMBL14173110 | 0.90 | THRB (0.65) | THRBKDM4EALDH1A1SMN1; SMN2GAA | |
| SCHEMBL23607007 | 0.86 | THRB (0.55) | THRBKDM4EALDH1A1SMN1; SMN2GAA | |
| SCHEMBL12726674 | 0.86 | THRB (0.57) | THRBKDM4EALDH1A1SMN1; SMN2GAA | |
| SCHEMBL7631129 | 0.86 | THRB (0.60) | THRBKDM4EALDH1A1SMN1; SMN2GAA | |
| SCHEMBL20394042 | 0.86 | THRB (0.60) | THRBKDM4EALDH1A1SMN1; SMN2GAA | |
| SCHEMBL12281676 | 0.86 | THRB (0.60) | THRBKDM4EALDH1A1SMN1; SMN2GAA | |
| SCHEMBL19770675 | 0.86 | THRB (0.60) | THRBKDM4EALDH1A1SMN1; SMN2GAA | |
| SCHEMBL16804047 | 0.86 | THRB (0.60) | THRBKDM4EALDH1A1SMN1; SMN2GAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11745302-B2 | Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process | APPLIED MATERIALS, INC. (US) | 2023-09-05 | — | — | US | disclosed |