⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24774637 | 1.00 | — | — | |
| SCHEMBL2476666 | 0.74 | — | — | |
| SCHEMBL18949957 | 0.72 | — | — | |
| SCHEMBL4574758 | 0.70 | — | — | |
| SCHEMBL3814729 | 0.70 | — | — | |
| SCHEMBL3032063 | 0.70 | — | — | |
| SCHEMBL981383 | 0.69 | — | — | |
| Hydrochloric Acid SCHEMBL3825225 | 0.68 | — | — | |
| SCHEMBL8977432 | 0.67 | LMNA (0.36) | — | |
| SCHEMBL21910751 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023223897-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND | 東京応化工業株式会社 | 2023-11-23 | — | — | WO | disclosed |
| WO-2023195407-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | 東京応化工業株式会社 | 2023-10-12 | — | — | WO | disclosed |
| WO-2023163008-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND POLYMER COMPOUND | 東京応化工業株式会社 | 2023-08-31 | — | — | WO | disclosed |