SCHEMBL2607322

SCHEMBL2607322

O=C1OC(=O)c2cc(Oc3ccc(C(c4ccc(Oc5ccc6c(c5)C(=O)OC6=O)cc4)(C(F)(F)F)C(F)(F)F)cc3)ccc21

nearest known ligand 0.43

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
MAOA P21397 5/20 0.43
MAOB P27338 5/20 0.43
TDP1 Q9NUW8 2/20 0.38
L3MBTL1 Q9Y468 2/20 0.38
MAPT P10636 1/20 0.38
ATM Q13315 1/20 0.36
LMNA P02545 1/20 0.36
ALDH1A1 P00352 1/20 0.35
PDK2 Q15119 1/20 0.35
ALOX15 P16050 1/20 0.34
ESR1 P03372 1/20 0.34
ESR2 Q92731 1/20 0.34
GSTP1 P09211 1/20 0.33
ACHE P22303 1/20 0.33
NPC1 O15118 1/20 0.33
POLB P06746 1/20 0.33
RAB9A P51151 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9849209 0.94 MAOA (0.40) MAOAMAOBTDP1L3MBTL1MAPT
SCHEMBL18180026 0.91 MAOA (0.37) MAOAMAOBTDP1L3MBTL1MAPT
SCHEMBL15699449 0.90 SRD5A2 (0.41) MAOAMAOBLMNANPC1POLB
SCHEMBL12583807 0.88 MAOA (0.45) MAOAMAOBTDP1L3MBTL1MAPT
SCHEMBL10416153 0.88 MAOB (0.45) MAOAMAOBTDP1L3MBTL1MAPT
SCHEMBL15699450 0.87 AKR1C3 (0.51) MAOAMAOBALDH1A1NPC1POLB
SCHEMBL11887460 0.85 MAOA (0.41) MAOAMAOBTDP1L3MBTL1MAPT
SCHEMBL1501398 0.83 MAOA (0.56) MAOAMAOBTDP1L3MBTL1MAPT
SCHEMBL30970619 0.83 MAOA (0.56) MAOAMAOBTDP1L3MBTL1MAPT
SCHEMBL84254 0.83 MAOA (0.56) MAOAMAOBTDP1L3MBTL1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9139696-B1 Aromatic diamines containing three ether-linked-benzonitrile moieties, polymers thereof, and methods of making the same THE UNITED STATES OF AMERICA, AS REPRESENTED BY THE SECRETARY OF THE AIR FORCE (US) 2015-09-22 US claimed
US-11782344-B2 Photosensitive polyimide compositions FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2023-10-10 US disclosed
US-20230260787-A1 COMPOSITION FOR FORMING PROTECTIVE FILM AGAINST ALKALINE AQUEOUS HYDROGEN PEROXIDE, SUBSTRATE FOR PRODUCING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING PROTECTIVE FILM, AND METHOD FOR FORMING PATTERN SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-17 US disclosed
EP-4215988-A1 COMPOSITION FOR FORMING PROTECTIVE FILM AGAINST ALKALINE AQUEOUS HYDROGEN PEROXIDE, SUBSTRATE FOR PRODUCING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING PROTECTIVE FILM, AND METHOD FOR FORMING PATTERN SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-07-26 EP disclosed
US-20230229080-A1 PHOTOSENSITIVE COMPOSITION AND FILM PREPARED FROM THE SAME INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2023-07-20 US disclosed
US-11692066-B2 Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-07-04 US disclosed
US-20230205085-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION DONGJIN SEMICHEM CO., LTD. (KR) 2023-06-29 US disclosed
WO-2023106104-A1 PHOTOSENSITIVE RESIN COMPOSITION 日産化学株式会社 2023-06-15 WO disclosed
CN-115947939-A Polymer, and production method and application thereof 上海邃铸科技有限公司 2023-04-11 CN disclosed
EP-3286606-B1 PHOTOSENSITIVE POLYIMIDE COMPOSITIONS FUJIFILM ELECTRONIC MAT USA INC (US) 2022-12-28 EP disclosed
US-7364797-B2 Adhesive composition and adhesive film SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-04-29 US disclosed
US-7364797-B2 Adhesive composition and adhesive film SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-04-29 US disclosed
US-20070191552-A1 excellent filling of substrates with finely patterned circuits, excellent lamination performance at low temperatures, a low elastic modulus, and excellent levels of adhesion and heat resistance for semiconductor packages; polyimidesiloxane copolymer, epoxy resin, finely powdered silica, curing catalyst SHIN-ETSU CHEMICAL CO., LTD. 2007-08-16 US disclosed
US-20070191552-A1 excellent filling of substrates with finely patterned circuits, excellent lamination performance at low temperatures, a low elastic modulus, and excellent levels of adhesion and heat resistance for semiconductor packages; polyimidesiloxane copolymer, epoxy resin, finely powdered silica, curing catalyst SHIN-ETSU CHEMICAL CO., LTD. 2007-08-16 US disclosed
US-20070120271-A1 Dicing and die bonding adhesive tape SHIN-ETSU CHEMICAL CO., LTD. 2007-05-31 US disclosed
US-20070120271-A1 Dicing and die bonding adhesive tape SHIN-ETSU CHEMICAL CO., LTD. 2007-05-31 US disclosed
US-20070090299-A1 Adhesive composition and sheet having an adhesive layer of the composition SHIN-ETSU CHEMICAL CO., LTD. 2007-04-26 US disclosed
US-20070090299-A1 Adhesive composition and sheet having an adhesive layer of the composition SHIN-ETSU CHEMICAL CO., LTD. 2007-04-26 US disclosed
US-20070066796-A1 Resin solution composition, polyimide resin, and semiconductor device SHIN-ETSU CHEMICAL CO., LTD. 2007-03-22 US disclosed
US-20070066796-A1 Resin solution composition, polyimide resin, and semiconductor device SHIN-ETSU CHEMICAL CO., LTD. 2007-03-22 US disclosed