SCHEMBL2607780

SCHEMBL2607780

CCC(C)(C)C(=O)OCC(=O)OC(C)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.31

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
CYP4F2 P78329 1/20 0.31
CYP4A11 Q02928 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10094797 0.82
SCHEMBL106999 0.82 CYP4F2 (0.34) CYP4F2CYP4A11
SCHEMBL10103515 0.81
SCHEMBL107561 0.80 CYP4F2 (0.33) CYP4F2CYP4A11
SCHEMBL107984 0.79 CYP4F2 (0.33) CYP4F2CYP4A11
SCHEMBL11987562 0.78 FGFR1 (0.34) CYP4F2CYP4A11
SCHEMBL800418 0.77 HTT (0.38) CYP4F2CYP4A11
SCHEMBL107985 0.77 CYP4F2 (0.35) CYP4F2CYP4A11
SCHEMBL18802892 0.77 HMGCR (0.33) CYP4F2CYP4A11
SCHEMBL2601745 0.77 CYP4F2 (0.32) CYP4F2CYP4A11

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8951709-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2015-02-10 US disclosed
US-20120100482-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-04-26 US disclosed