Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.41 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | APEX1 | P27695 | 1/20 | 0.35 |
| ▸ | HTT | P42858 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | THRB | P10828 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22662309 | 0.82 | TSHR (0.42) | TSHRPOLBAPEX1HTTTDP1 | |
| SCHEMBL2607869 | 0.82 | TSHR (0.37) | TSHRTHRBALDH1A1 | |
| SCHEMBL10189288 | 0.82 | THRB (0.41) | TSHRPOLBAPEX1HTTTDP1 | |
| SCHEMBL23563134 | 0.78 | TSHR (0.39) | TSHRPOLBAPEX1HTTTDP1 | |
| SCHEMBL18623653 | 0.78 | TSHR (0.51) | TSHRPOLBAPEX1HTTTDP1 | |
| SCHEMBL15449222 | 0.77 | THRB (0.40) | TSHRPOLBAPEX1HTTTDP1 | |
| SCHEMBL6849323 | 0.76 | TSHR (0.56) | TSHRPOLBAPEX1HTTTDP1 | |
| SCHEMBL22662269 | 0.76 | THRB (0.39) | TSHRPOLBAPEX1HTTTDP1 | |
| SCHEMBL2628305 | 0.76 | THRB (0.55) | TSHRPOLBAPEX1HTTTDP1 | |
| SCHEMBL12770293 | 0.75 | TSHR (0.51) | TSHRPOLBAPEX1HTTTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8642244-B2 | Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-02-04 | — | — | US | disclosed |
| US-8501387-B2 | — | — | 2013-08-06 | — | — | US | disclosed |
| US-8475997-B2 | Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-07-02 | — | — | US | disclosed |
| US-20120094236-A1 | RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST PATTERN, AND FLUORINE-CONTAINING POLYMERIC COMPOUND | SHIONO DAIJU (JP) | 2012-04-19 | — | — | US | disclosed |
| US-20120077125-A1 | RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST PATTERN USING THE SAME, AND FLUORINE-CONTAINING COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-03-29 | — | — | US | disclosed |