SCHEMBL26082906

SCHEMBL26082906

CC(I)C(=O)OC1C2CC3C1OC(=O)C3C2C(=O)OC1CC(C)(C)N(C)C(C)(C)C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26083088 0.93 GAA (0.34) —
SCHEMBL26807868 0.78 — —
SCHEMBL26083109 0.77 GAA (0.34) —
SCHEMBL19261159 0.74 CHRNA1 (0.31) —
SCHEMBL16328887 0.74 ALDH1A1 (0.34) —
SCHEMBL18845383 0.73 FABP7 (0.32) —
SCHEMBL23871042 0.73 CYP2D6 (0.37) —
SCHEMBL6368305 0.73 CYP3A4 (0.34) —
SCHEMBL26083089 0.72 GAA (0.31) —
SCHEMBL25142158 0.72 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11782343-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-10 — — US disclosed
US-11782343-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-10 — — US disclosed
Send feedback