⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26785380 | 0.90 | — | — | |
| SCHEMBL26784670 | 0.84 | — | — | |
| SCHEMBL19261158 | 0.75 | — | — | |
| SCHEMBL26785387 | 0.74 | — | — | |
| SCHEMBL6367915 | 0.73 | HMGCR (0.33) | — | |
| SCHEMBL26083088 | 0.73 | GAA (0.34) | — | |
| SCHEMBL26082906 | 0.72 | — | — | |
| SCHEMBL25845182 | 0.72 | — | — | |
| SCHEMBL16328887 | 0.72 | ALDH1A1 (0.34) | — | |
| SCHEMBL26478379 | 0.72 | KMT2A (0.42) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11822245-B2 | Resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-21 | — | — | US | disclosed |
| US-11822245-B2 | Resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-21 | — | — | US | disclosed |
| US-20230120132-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-20 | — | — | US | disclosed |