SCHEMBL260837

SCHEMBL260837

C=CC(=O)OCCCOC(=O)CC(O)C(=O)OCCCOC(=O)C=C

nearest known ligand 0.55

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
TSHR P16473 7/20 0.55
ALDH1A1 P00352 4/20 0.55
CYP3A4 P08684 2/20 0.55
HPGD P15428 1/20 0.50
TP53 P04637 3/20 0.46
HIF1A Q16665 3/20 0.46
HSD17B10 Q99714 1/20 0.46
THRB P10828 2/20 0.39
MAPK1 P28482 2/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
ATM Q13315 1/20 0.32
NAAA Q02083 1/20 0.32
MAPT P10636 1/20 0.31
NPSR1 Q6W5P4 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL261228 0.93 TSHR (0.53) TSHRALDH1A1CYP3A4HPGDTP53
Hydroxyl Radical SCHEMBL28232486 0.91 TSHR (0.52) TSHRALDH1A1CYP3A4HPGDTP53
SCHEMBL28312031 0.79 TSHR (0.42) TSHRALDH1A1CYP3A4HPGDTP53
SCHEMBL321925 0.79 TSHR (0.85) TSHRALDH1A1CYP3A4HPGDTP53
SCHEMBL8416378 0.79 TSHR (0.53) TSHRALDH1A1CYP3A4HPGDTP53
SCHEMBL11337706 0.78 TSHR (0.68) TSHRALDH1A1CYP3A4HPGDTP53
SCHEMBL10493413 0.77 TSHR (0.68) TSHRALDH1A1CYP3A4HPGDTP53
SCHEMBL9155974 0.77 TSHR (0.68) TSHRALDH1A1CYP3A4HPGDTP53
SCHEMBL2391946 0.77 TSHR (0.52) TSHRALDH1A1CYP3A4HPGDTP53
SCHEMBL28470987 0.77 TSHR (0.81) TSHRALDH1A1CYP3A4HPGDTP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110007562-A Photopolymerizable unsaturated-resin and photosensitive resin composition containing the photopolymerizable unsaturated-resin 罗门哈斯电子材料韩国有限公司 2019-07-12 CN claimed
CN-103890659-A Photopolymerizable unsaturated resin, photosensitive resin composition containing the same, and light-shielding spacer and liquid crystal display device prepared therefrom ROHM & HAAS ELECT MAT 2014-06-25 CN claimed
CN-102681344-A Photosensitive resin composition, low dielectric constant light shielding layer and liquid crystal display apparatus using the same ROHM & HAAS ELECT MAT 2012-09-19 CN claimed
US-11667730-B2 Oxime ester compound and photopolymerization initiator containing the same ADEKA CORPORATION (JP) 2023-06-06 US disclosed
EP-3339331-B1 COMPOSITION ADEKA CORP (JP) 2022-02-16 EP disclosed
CN-106132929-B Oxime ester compound and photopolymerization initiator containing the same 株式会社艾迪科 2020-06-19 CN disclosed
EP-3176153-B1 NOVEL POLYMERIZATION INITIATOR AND RADICALLY POLYMERIZABLE COMPOSITION CONTAINING SAME ADEKA CORP (JP) 2020-04-08 EP disclosed
US-10189847-B2 Oxime ester compound and photopolymerization initiator containing said compound ADEKA CORPORATION (JP) 2019-01-29 US disclosed
CN-108699183-A Composition and new compound 株式会社艾迪科 2018-10-23 CN disclosed
CN-108473609-A Photosensitive composite and new compound 株式会社艾迪科 2018-08-31 CN disclosed
CN-108369831-A Conductive paste 株式会社艾迪科 2018-08-03 CN disclosed
EP-2145880-A1 NOVEL EPOXY COMPOUND, ALKALI-DEVELOPABLE RESIN COMPOSITION, AND ALKALI-DEVELOPABLE PHOTOSENSITIVE RESIN COMPOSITION Adeka Corporation (JP) 2010-01-20 EP disclosed
CN-100580555-C Alkaline developable resin composition ADEKA CORP 2010-01-13 CN disclosed
EP-2128132-A1 OXIME ESTER COMPOUND AND PHOTOPOLYMERIZATION INITIATOR COMPRISING THE COMPOUND Adeka Corporation (JP) 2009-12-02 EP disclosed
US-20090292039-A1 OXIME ESTER COMPOUND AND PHOTOPOLYMERIZATION INITIATOR CONTAINING THE SAME ADEKA CORPORATION (JP) 2009-11-26 US disclosed
EP-2072500-A1 OXIME ESTER COMPOUND AND PHOTOPOLYMERIZATION INITIATOR CONTAINING THE COMPOUND Adeka Corporation (JP) 2009-06-24 EP disclosed
US-20070269720-A1 Alkali-Developable, Colored Photosensitive Resin Composition and Color Filter Using The Alkali-Developable, Colored Photosensitive Resin Composition TOPPAN PRINTING CO., LTD. (JP) 2007-11-22 US disclosed
CN-101023394-A Colored alkali developable photosensitive resin composition, and color filter using said colored alkali developable photosensitive resin compositoin TOPPAN PRINTING CO LTD (JP) 2007-08-22 CN disclosed
CN-1885162-A Alkali developing photosensitive resin composition ADEKA CORP (JP) 2006-12-27 CN disclosed
CN-1860415-A Alkali developable resin composition ASAHI DENKA CO LTD (JP) 2006-11-08 CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11667730-B2 Oxime ester compound and photopolymerization initiator containing the same OXER1, CYP4A11, CYP4F11 TSHR 344/4885ALDH1A1 2056/4885CYP3A4 27/4885
US-10189847-B2 Oxime ester compound and photopolymerization initiator containing said compound PPOX, CCNO, MRTO4 TSHR 2007/4885ALDH1A1 1193/4885CYP3A4 370/4885
US-20090292039-A1 OXIME ESTER COMPOUND AND PHOTOPOLYMERIZATION INITIATOR CONTAINING THE SAME OXER1, CYP4A11, CYP4F11 TSHR 429/4885ALDH1A1 2106/4885CYP3A4 32/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.