SCHEMBL260944

SCHEMBL260944

COC(=O)COCCO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL721176 0.95 MEN1 (0.50)
SCHEMBL1401431 0.95 MEN1 (0.50)
SCHEMBL30737022 0.91 TSHR (0.46)
SCHEMBL6463788 0.87 TSHR (0.50)
1-Pentanol SCHEMBL28223190 0.86 MEN1 (0.47)
SCHEMBL8941662 0.86 TSHR (0.42)
SCHEMBL7648165 0.84 TSHR (0.48)
Ethylene Glycol SCHEMBL9359880 0.84 TSHR (0.48)
Ethylene Glycol SCHEMBL9359829 0.84 TSHR (0.48)
SCHEMBL1038709 0.84 GAA (0.44)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1086 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12517047-B2 Transport and detection of explosive samples ALTI LLC (US) 2026-01-06 US claimed
US-20250237601-A1 TRANSPORT AND DETECTION OF EXPLOSIVE SAMPLES ALTI LLC 2025-07-24 US claimed
US-12216403-B2 Positive photosensitive resin composition and display device using the same DONJIN SEMICHEM CO., LTD. (KR) 2025-02-04 US claimed
US-20240118616-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND DISPLAY DEVICE USING THE SAME DONGJIN SEMICHEM CO., LTD. (KR) 2024-04-11 US claimed
US-11450837-B2 Display device SAMSUNG DISPLAY CO., LTD. (KR) 2022-09-20 US claimed
US-20210091343-A1 DISPLAY DEVICE SAMSUNG DISPLAY CO., LTD. (KR) 2021-03-25 US claimed
US-10705424-B2 Negative-working photoresist compositions for laser ablation and use thereof MERCK PATENT GMBH (DE) 2020-07-07 US claimed
CN-111100485-A Mask slurry and preparation method thereof 潮州三环(集团)股份有限公司 2020-05-05 CN claimed
CN-111061125-A Photoresist and application thereof 常州强力先端电子材料有限公司 2020-04-24 CN claimed
CN-110836938-A Detection method of furan metabolites in aquatic products and preparation method of solid-phase extraction column 广州智汇生物科技有限公司 2020-02-25 CN claimed
US-10450487-B2 One-part water-based adhesive composition CEMEDINE CO., LTD (JP) 2019-10-22 US claimed
US-9746767-B2 Photoresist composition and method of manufacturing black matrix using the same SAMSUNG DISPLAY CO., LTD. (KR) 2017-08-29 US claimed
US-20160195806-A1 PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING BLACK MATRIX USING THE SAME SAMSUNG DISPLAY CO., LTD. (KR) 2016-07-07 US claimed
US-8481428-B2 Polishing slurry and polishing method HITACHI CHEMICAL CO., LTD. (JP) 2013-07-09 US claimed
US-20120064721-A1 POLISHING SLURRY AND POLISHING METHOD HITACHI CHEMICAL CO., LTD. (JP) 2012-03-15 US claimed
US-20100197527-A1 METHODS AND COMPOSITIONS RELATING TO THE HYDROLYSIS OF WATER-HYDROLYSABLE MATERIALS HALLIBURTON ENERGY SERVICES, INC. 2010-08-05 US claimed
WO-2006079777-A1 METHODS AND COMPOSITIONS RELATING TO THE HYDROLYSIS OF WATER-HYDROLYSABLE MATERIALS HALLIBURTON ENERGY SERVICES, INC. (US) 2006-08-03 WO claimed
US-20060169182-A1 Methods and compositions relating to the hydrolysis of water-hydrolysable materials HALLIBURTON ENERGY SERVICES, INC. 2006-08-03 US claimed
US-20050037941-A1 Contaminant-tolerant foaming additive BENCHMARK RESEARCH AND TECHNOLOGY, INC. 2005-02-17 US claimed
US-5034015-A Fade resistant hair dyes with better coloring ability L'OREAL (FR) 1991-07-23 US claimed