SCHEMBL2614745

SCHEMBL2614745

COc1ccc2ccc(OC)c(C)c2c1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA12 O43570 1/20 0.54
CA1 P00915 1/20 0.54
CA2 P00918 1/20 0.54
CA7 P43166 1/20 0.54
CA9 Q16790 1/20 0.54
CA14 Q9ULX7 1/20 0.54
MAPT P10636 3/20 0.47
MEN1 O00255 3/20 0.47
KMT2A Q03164 3/20 0.47
ALDH1A1 P00352 3/20 0.47
THRB P10828 1/20 0.47
CYP1A2 P05177 2/20 0.47
CYP2A6 P11509 1/20 0.47
MTNR1A P48039 3/20 0.47
MTNR1B P49286 3/20 0.47
NQO1 P15559 1/20 0.45
KDM4E B2RXH2 2/20 0.44
TSHR P16473 1/20 0.44
GFER P55789 1/20 0.44
HSD17B10 Q99714 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30503987 0.86 CA12 (0.52) CA12CA1CA2CA7CA9
SCHEMBL4194130 0.86 CA12 (0.52) CA12CA1CA2CA7CA9
SCHEMBL10103841 0.83 CA12 (0.40) CA12CA1CA2CA7CA9
SCHEMBL9795842 0.82 CYP1A2 (0.48) MAPTMEN1KMT2AALDH1A1CYP1A2
SCHEMBL12657996 0.82 ACHE (0.56) MAPTMEN1KMT2AALDH1A1CYP1A2
SCHEMBL19382614 0.80 CYP1A2 (0.61) CA12CA1CA2CA7CA9
SCHEMBL7129654 0.80 IDO1 (0.54) CA12CA1CA2CA7CA9
SCHEMBL29137562 0.78 CYP11B1 (0.54) CA12CA1CA2CA7CA9
SCHEMBL10823084 0.78 ALDH1A1 (0.55) CA12CA1CA2CA7CA9
SCHEMBL8518991 0.78 CA12 (0.52) CA12CA1CA2CA7CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2409979-B1 PROCESS FOR PRODUCTION OF PHOSPHORUS-ATOM-CONTAINING PHENOL, NOVEL PHOSPHORUS-ATOM-CONTAINING PHENOL, CURABLE RESIN COMPOSITION, CURED PRODUCT THEREOF, PRINTED CIRCUIT BOARD, AND SEMICONDUCTOR SEALING MATERIAL DAINIPPON INK & CHEMICALS (JP) 2019-06-26 EP disclosed
US-9217053-B2 Active ester resin, thermosetting resin composition, cured product of same, semiconductor encapsulation material, prepreg, circuit board, and build-up film DIC CORPORATION (JP) 2015-12-22 US disclosed
US-20150118499-A1 ACTIVE ESTER RESIN, THERMOSETTING RESIN COMPOSITION, CURED PRODUCT OF SAME, SEMICONDUCTOR ENCAPSULATION MATERIAL, PREPREG, CIRCUIT BOARD, AND BUILD-UP FILM DIC CORPORATION (JP) 2015-04-30 US disclosed
US-8440781-B2 Epdxy resin composition and cured article thereof, semiconductor encapsulation material, novel phenol resin, and novel epdoxy resin DAINIPPON INK AND CHEMICALS, INC. (JP) 2013-05-14 US disclosed
US-8440781-B2 Epdxy resin composition and cured article thereof, semiconductor encapsulation material, novel phenol resin, and novel epdoxy resin DAINIPPON INK AND CHEMICALS, INC. (JP) 2013-05-14 US disclosed
US-8420749-B2 Epoxy resin composition and cured article thereof, semiconductor encapsulation material, novel phenol resin, and novel epoxy resin DAINIPPON INK AND CHEMICALS, INC. (JP) 2013-04-16 US disclosed
US-8420749-B2 Epoxy resin composition and cured article thereof, semiconductor encapsulation material, novel phenol resin, and novel epoxy resin DAINIPPON INK AND CHEMICALS, INC. (JP) 2013-04-16 US disclosed
US-8288003-B2 Method for producing phosphorus-containing phenolic compound, novel phosphorus-containing phenol, curable resin composition, cured product of the same, printed wiring board, and semiconductor sealing material DIC CORPORATION (JP) 2012-10-16 US disclosed
EP-2185507-B1 FUNGICIDE N-6-MEMBERED FUSED (HETERO)ARYL-METHYLENE-N-CYCLOALKYL CARBOXAMIDE DERIVATIVES BAYER CROPSCIENCE AG (DE) 2012-04-25 EP disclosed
US-20120095156-A1 METHOD FOR PRODUCING PHOSPHORUS-CONTAINING PHENOLIC COMPOUND, NOVEL PHOSPHORUS-CONTAINING PHENOL, CURABLE RESIN COMPOSITION, CURED PRODUCT OF THE SAME, PRINTED WIRING BOARD, AND SEMICONDUCTOR SEALING MATERIAL DIC CORPORATION (JP) 2012-04-19 US disclosed
US-7985822-B2 Epoxy resin cured with phenol-formaldehyde resin DAINIPPON INK AND CHEMICALS, INC. (JP) 2011-07-26 US disclosed
US-20100087590-A1 EPOXY RESIN COMPOSITION AND CURED ARTICLE THEREOF, SEMICONDUCTOR ENCAPSULATION MATERIAL, NOVEL PHENOL RESIN, AND NOVEL EPOXY RESIN DAINIPPON INK AND CHEMICALS, INC. (JP) 2010-04-08 US disclosed
US-20090054585-A1 EPOXY RESIN COMPOSITION AND CURED ARTICLE THEREOF, SEMICONDUCTOR ENCAPSULATION MATERIAL, NOVEL PHENOL RESIN, AND NOVEL EPOXY RESIN DAINIPPON INK AND CHEMICALS, INC. (JP) 2009-02-26 US disclosed
US-20080255315-A1 Epoxy Resin Composition,Cured Article Thereof, Semiconductor Sealing Material, Novel Phenol Resin, Novel Epoxy Resin,Method for Producing Novel Phenol Resin, And Method For Producing Novel Epoxy Resin DAINIPPON INK AND CHEMICALS, INC. (JP) 2008-10-16 US disclosed
EP-0737670-B1 Tricyclic amides, processes for their preparation, and pharmaceutical compositions containing them ADIR (FR) 1999-07-21 EP disclosed
EP-0737670-A1 Tricyclic amides, processes for their preparation, and pharmaceutical compositions containing them ADIR ET COMPAGNIE (FR) 1996-10-16 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120095156-A1 METHOD FOR PRODUCING PHOSPHORUS-CONTAINING PHENOLIC COMPOUND, NOVEL PHOSPHORUS-CONTAINING PHENOL, CURABLE RESIN COMPOSITION, CURED PRODUCT OF THE SAME, PRINTED WIRING BOARD, AND SEMICONDUCTOR SEALING MATERIAL PPA1, RBBP4, SMARCB1 CA12 2399/4885CA1 680/4885CA2 703/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.