SCHEMBL26163071

SCHEMBL26163071

Nc1cccc(F)c1C(=O)NS(=O)(=O)C(F)(F)F

nearest known ligand 0.42

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ CRBN Q96SW2 1/20 0.42
▸ CES2 O00748 1/20 0.39
▸ CES1 P23141 1/20 0.39
▸ KMT2A Q03164 4/20 0.37
▸ MEN1 O00255 3/20 0.37
▸ PTGS1 P23219 2/20 0.36
▸ HDAC1 Q13547 1/20 0.36
▸ PREP P48147 1/20 0.36
▸ JAK2 O60674 1/20 0.36
▸ JAK1 P23458 1/20 0.36
▸ TYK2 P29597 1/20 0.36
▸ HTT P42858 1/20 0.36
▸ NOD2 Q9HC29 1/20 0.36
▸ TLR7 Q9NYK1 1/20 0.35
▸ HPGD P15428 1/20 0.35
▸ ITGB2 P05107 1/20 0.35
▸ ICAM1 P05362 1/20 0.35
▸ ITGAL P20701 1/20 0.35
▸ GAA P10253 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22503312 0.89 KMT2A (0.46) CES2CES1KMT2AMEN1JAK2
SCHEMBL26163063 0.82 TLR7 (0.45) CES2CES1KMT2AMEN1JAK2
SCHEMBL22503182 0.78 CES2 (0.36) CES2CES1HPGD
SCHEMBL23014667 0.76 PTGS1 (0.51) PTGS1HPGDGAA
SCHEMBL22503187 0.76 CA1 (0.34) CES2CES1PTGS1
SCHEMBL26163054 0.74 HPGD (0.61) CES2CES1KMT2AMEN1HTT
SCHEMBL22789846 0.74 RXFP1 (0.39) KMT2AMEN1PTGS1TLR7
SCHEMBL14454234 0.74 NPC1 (0.44) CRBNCES2CES1KMT2AMEN1
SCHEMBL1202579 0.74 GAA (0.52) CRBNCES2CES1KMT2AMEN1
SCHEMBL8234056 0.73 CRBN (0.45) CRBNCES2CES1KMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 — — US disclosed
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 — — US disclosed
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