Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TACR1 | P25103 | 1/20 | 0.47 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.46 |
| ▸ | SLC1A3 | P43003 | 1/20 | 0.46 |
| ▸ | SLC1A2 | P43004 | 1/20 | 0.46 |
| ▸ | SLC1A1 | P43005 | 1/20 | 0.46 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.44 |
| ▸ | RAB9A | P51151 | 1/20 | 0.43 |
| ▸ | CACNA1B | Q00975 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.42 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.42 |
| ▸ | MAOB | P27338 | 1/20 | 0.41 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.41 |
| ▸ | CTSL | P07711 | 1/20 | 0.41 |
| ▸ | CTSB | P07858 | 1/20 | 0.41 |
| ▸ | CTSS | P25774 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29503697 | 1.00 | TACR1 (0.47) | TACR1CYP1A2SLC1A3SLC1A2SLC1A1 | |
| SCHEMBL11145716 | 0.95 | TACR1 (0.43) | TACR1CYP1A2SLC1A3SLC1A2SLC1A1 | |
| SCHEMBL15020207 | 0.95 | TACR1 (0.43) | TACR1CYP1A2SLC1A3SLC1A2SLC1A1 | |
| SCHEMBL15020074 | 0.95 | TACR1 (0.43) | TACR1CYP1A2SLC1A3SLC1A2SLC1A1 | |
| SCHEMBL1324374 | 0.94 | CA2 (0.43) | TACR1CYP1A2SLC1A3SLC1A2SLC1A1 | |
| SCHEMBL1323726 | 0.88 | CA2 (0.40) | TACR1CYP1A2RAB9AALDH1A1 | |
| SCHEMBL908789 | 0.88 | CA2 (0.40) | TACR1CYP1A2SLC1A3SLC1A2SLC1A1 | |
| SCHEMBL28936084 | 0.87 | CYP1A2 (0.54) | TACR1CYP1A2SLC1A3SLC1A2SLC1A1 | |
| SCHEMBL29503741 | 0.87 | CYP1A2 (0.50) | TACR1CYP1A2ALDH1A1L3MBTL1 | |
| SCHEMBL13609729 | 0.87 | CYP1A2 (0.50) | TACR1CYP1A2ALDH1A1L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 112 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250243389-A1 | COMPOSITION COMPRISING ADDITIVE HAVING A POLYCYCLIC AROMATIC GROUP | E INK CORPORATION | 2025-07-31 | — | — | US | claimed |
| CN-106886127-A | Photoimprint resin composition, photoimprint resin film, and patterning process | 财团法人工业技术研究院 | 2017-06-23 | — | — | CN | claimed |
| CN-105493236-A | Curable composition for photoimprint and method for producing film, optical component, circuit board or electronic component using the same | CANON KK | 2016-04-13 | — | — | CN | claimed |
| CN-101880352-A | Be used for multipolymer, its preparation method of gap filling material composition and be used for the gap filling material composition of antireflecting coating | KOREA KUMHO PETROCHEM CO LTD | 2010-11-10 | — | — | CN | claimed |
| WO-2007110387-A1 | PHOTO-CURABLE RESINS AND RESIN COMPOSITIONS WITH VERY HIGH REFRACTIVE INDICES FOR APPLICATION IN PLASIC OPTICS | SEEREAL TECHNOLOGIES S.A. (DE) | 2007-10-04 | — | — | WO | claimed |
| EP-1840652-A1 | Photo-curable resins and resin compositions with very high refractive indices for application in plastic optics | SeeReal Technologies S.A. (LU) | 2007-10-03 | — | — | EP | claimed |
| US-20250243389-A1 | COMPOSITION COMPRISING ADDITIVE HAVING A POLYCYCLIC AROMATIC GROUP | E INK CORPORATION | 2025-07-31 | — | — | US | disclosed |
| US-11822248-B2 | Coating compositions for use with an overcoated photoresist | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2023-11-21 | — | — | US | disclosed |
| US-11762292-B2 | Coating compositions for use with an overcoated photoresist | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2023-09-19 | — | — | US | disclosed |
| EP-4214247-A1 | COMPOSITION COMPRISING ADDITIVE HAVING A POLYCYCLIC AROMATIC GROUP | E Ink Corporation (US) | 2023-07-26 | — | — | EP | disclosed |
| CN-115989251-A | Composition comprising an additive having polycyclic aromatic groups | 伊英克公司 | 2023-04-18 | — | — | CN | disclosed |
| US-20220081596-A1 | COMPOSITION COMPRISING ADDITIVE HAVING A POLYCYCLIC AROMATIC GROUP | E INK CORPORATION | 2022-03-17 | — | — | US | disclosed |
| US-20210047449-A1 | COPOLYMER AND COLORED RESIN COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-02-18 | — | — | US | disclosed |
| US-7687228-B2 | Antireflection film composition and patterning process using the same | SHIN ETSU CHEMICAL CO., LTD. (JP) | 2010-03-30 | — | — | US | disclosed |
| US-20080227037-A1 | Resist lower layer film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-09-18 | — | — | US | disclosed |
| US-20080227037-A1 | Resist lower layer film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-09-18 | — | — | US | disclosed |
| US-20080220381-A1 | Antireflection film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-09-11 | — | — | US | disclosed |
| US-20080220381-A1 | Antireflection film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-09-11 | — | — | US | disclosed |
| WO-2007110387-A1 | PHOTO-CURABLE RESINS AND RESIN COMPOSITIONS WITH VERY HIGH REFRACTIVE INDICES FOR APPLICATION IN PLASIC OPTICS | SEEREAL TECHNOLOGIES S.A. (DE) | 2007-10-04 | — | — | WO | disclosed |
| EP-1840652-A1 | Photo-curable resins and resin compositions with very high refractive indices for application in plastic optics | SeeReal Technologies S.A. (LU) | 2007-10-03 | — | — | EP | disclosed |