SCHEMBL26208685

SCHEMBL26208685

CSc1c(F)c(F)c(Oc2ccc(I)cc2C(=O)OCc2ccccc2I)c(F)c1F

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TSHR P16473 3/20 0.39
▸ L3MBTL1 Q9Y468 2/20 0.39
▸ NPC1 O15118 2/20 0.39
▸ GLA P06280 1/20 0.39
▸ ALDH1A1 P00352 7/20 0.36
▸ LMNA P02545 3/20 0.36
▸ KDM4E B2RXH2 3/20 0.36
▸ CASP3 P42574 2/20 0.34
▸ HTT P42858 2/20 0.34
▸ SENP8 Q96LD8 2/20 0.34
▸ SENP7 Q9BQF6 2/20 0.34
▸ SENP6 Q9GZR1 2/20 0.34
▸ GAA P10253 3/20 0.33
▸ SMN1; SMN2 Q16637 1/20 0.33
▸ CYP1A2 P05177 1/20 0.32
▸ CYP2D6 P10635 1/20 0.32
▸ CYP2C9 P11712 1/20 0.32
▸ CYP2C19 P33261 1/20 0.32
▸ MRGPRX4 Q96LA9 1/20 0.32
▸ PRKCZ Q05513 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26206440 0.69 KDM4E (0.33) TSHRL3MBTL1ALDH1A1LMNAKDM4E
SCHEMBL26208678 0.66 — —
SCHEMBL26208813 0.66 NPC1 (0.37) TSHRL3MBTL1NPC1ALDH1A1LMNA
SCHEMBL26206441 0.65 — —
SCHEMBL26206450 0.64 CA12 (0.36) NPC1GLAALDH1A1KDM4EHTT
SCHEMBL12114332 0.64 KMT2A (0.52) TSHRL3MBTL1ALDH1A1LMNAPRKCZ
SCHEMBL31124443 0.62 CYP1A2 (0.43) TSHRNPC1LMNAGAASMN1; SMN2
SCHEMBL6723725 0.62 ESR1 (0.53) NPC1LMNAKMT2ARAB9ASLC6A2
SCHEMBL5203530 0.62 HTT (0.53) TSHRL3MBTL1ALDH1A1LMNAKDM4E
SCHEMBL28982407 0.61 PPARG (0.61) TSHRL3MBTL1ALDH1A1LMNAGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023162565-A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD 富士フイルム株式会社 2023-08-31 — — WO disclosed
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