SCHEMBL26214835

SCHEMBL26214835

Cc1cc([SH]2CCCCC2)cc(C)c1OC(=O)C12CC3CC4CC(C1)C2(C4)C3

nearest known ligand 0.31

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26056044 0.99 MEN1 (0.31) MEN1KMT2A
SCHEMBL25658019 0.83 MEN1 (0.45) MEN1KMT2A
SCHEMBL25658018 0.81 MEN1 (0.46) MEN1KMT2A
SCHEMBL26229899 0.78
SCHEMBL25818119 0.66 CYP17A1 (0.39)
SCHEMBL25658016 0.62 ALDH1A1 (0.33) MEN1KMT2A
SCHEMBL98168 0.61 GAA (0.43) MEN1KMT2A
SCHEMBL23021652 0.61 NPSR1 (0.30)
SCHEMBL25819629 0.60 ALDH1A1 (0.33)
SCHEMBL25818116 0.60

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024135498-A1 RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND 東京応化工業株式会社 2024-06-27 WO disclosed
WO-2023162907-A1 RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID GENERATION AGENT 東京応化工業株式会社 2023-08-31 WO disclosed