⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL109879 | 0.86 | LMNA (0.53) | — | |
| SCHEMBL27306971 | 0.83 | FOLH1 (0.58) | — | |
| SCHEMBL162041 | 0.83 | LMNA (0.50) | — | |
| SCHEMBL12491912 | 0.83 | LMNA (0.50) | — | |
| Hydrochloric Acid SCHEMBL4199437 | 0.83 | LMNA (0.50) | — | |
| SCHEMBL28473579 | 0.83 | LMNA (0.50) | — | |
| SCHEMBL5035377 | 0.83 | LMNA (0.50) | — | |
| SCHEMBL20415450 | 0.83 | LMNA (0.50) | — | |
| SCHEMBL17433002 | 0.83 | LMNA (0.50) | — | |
| SCHEMBL289203 | 0.81 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 367 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114127637-A | Photosensitive resin composition | 株式会社三养社 | 2022-03-01 | — | — | CN | claimed |
| EP-3753997-B1 | LATENT ADDITIVE AND COMPOSITION CONTAINING LATENT ADDITIVE | ADEKA CORP (JP) | 2026-05-06 | — | — | EP | disclosed |
| EP-3819291-B1 | OXIME ESTER COMPOUND AND PHOTOPOLYMERIZATION INITIATOR CONTAINING SAME | ADEKA CORP (JP) | 2026-04-15 | — | — | EP | disclosed |
| US-12286491-B2 | Image forming device and image forming method | RICOH COMPANY, LTD. (JP) | 2025-04-29 | — | — | US | disclosed |
| CN-110869343-B | Compound, latent antioxidant, composition, cured product, and method for producing cured product | 株式会社艾迪科 | 2025-04-25 | — | — | CN | disclosed |
| CN-110520794-B | Polymerizable composition, photosensitive composition for black matrix, and photosensitive composition for black column spacer | 株式会社艾迪科 | 2025-04-04 | — | — | CN | disclosed |
| CN-111417623-B | Compound, latent base generator, photosensitive resin composition containing the compound, and cured product | 株式会社艾迪科 | 2025-01-07 | — | — | CN | disclosed |
| CN-119241493-A | Photopolymerization initiator, and photo-curing composition and application thereof | 武汉尚赛光电科技有限公司 | 2025-01-03 | — | — | CN | disclosed |
| CN-110546134-B | Oxime ester compound and photopolymerization initiator containing the same | 株式会社艾迪科 | 2024-12-20 | — | — | CN | disclosed |
| CN-112004800-B | Oxime ester compound and photopolymerization initiator containing the same | 株式会社ADEKA | 2024-12-03 | — | — | CN | disclosed |
| US-5006441-A | Redespersibility; storage stability; antisoilants; durability and fixability; image-reproduction | FUJI PHOTO FILM CO., LTD. (JP) | 1991-04-09 | — | — | US | disclosed |
| EP-0416591-A2 | Electrophotographic light-sensitive material | FUJI PHOTO FILM CO., LTD. (JP) | 1991-03-13 | — | — | EP | disclosed |
| EP-0410324-A2 | Electrophotographic light-sensitive material | FUJI PHOTO FILM CO., LTD (JP) | 1991-01-30 | — | — | EP | disclosed |
| EP-0407936-A2 | Electrophotographic light-sensitive material | FUJI PHOTO FILM CO., LTD. (JP) | 1991-01-16 | — | — | EP | disclosed |
| EP-0405499-A2 | Electrophotographic light-sensitive material | FUJI PHOTO FILM CO., LTD. (JP) | 1991-01-02 | — | — | EP | disclosed |
| EP-0389928-A2 | Electrophotographic light-sensitive material | FUJI PHOTO FILM CO., LTD. (JP) | 1990-10-03 | — | — | EP | disclosed |
| EP-0366491-A2 | Liquid developers for electrophotography | FUJI PHOTO FILM CO., LTD. (JP) | 1990-05-02 | — | — | EP | disclosed |
| EP-0366492-A2 | Liquid developer for electrostatic photography | FUJI PHOTO FILM CO., LTD. (JP) | 1990-05-02 | — | — | EP | disclosed |
| EP-0362804-A2 | Electrophotographic photoreceptor | FUJI PHOTO FILM CO., LTD. (JP) | 1990-04-11 | — | — | EP | disclosed |
| EP-0352697-A2 | Electrophotographic photoreceptor | FUJI PHOTO FILM CO., LTD. (JP) | 1990-01-31 | — | — | EP | disclosed |