SCHEMBL26239486

SCHEMBL26239486

CCCCC(CC)COC(=O)C(CC)CCOCC(C)OCCOP(=O)(O)O

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 5/20 0.40
TSHR P16473 3/20 0.40
ATM Q13315 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
RECQL P46063 1/20 0.38
LPAR3 Q9UBY5 6/20 0.38
LPAR1 Q92633 5/20 0.38
ALDH1A1 P00352 3/20 0.37
CA2 P00918 2/20 0.37
MMP9 P14780 1/20 0.37
MMP8 P22894 1/20 0.37
MMP14 P50281 1/20 0.37
LPAR5 Q9H1C0 1/20 0.36
CA1 P00915 1/20 0.35
LMNA P02545 2/20 0.34
LPAR2 Q9HBW0 2/20 0.34
MAPK1 P28482 1/20 0.34
HSD17B10 Q99714 1/20 0.34
PRSS1 P07477 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26207137 0.82 CYP3A4 (0.49) CYP3A4TSHRATMTDP1L3MBTL1
SCHEMBL26207142 0.80 CYP3A4 (0.49) CYP3A4TSHRATMTDP1L3MBTL1
SCHEMBL26663431 0.79 LPAR3 (0.47) CYP3A4TDP1L3MBTL1LPAR3LPAR1
SCHEMBL26225029 0.77 TSHR (0.41) CYP3A4TSHRATMTDP1L3MBTL1
SCHEMBL4397097 0.77 CYP3A4 (0.57) CYP3A4TSHRATMTDP1L3MBTL1
SCHEMBL6855966 0.76 CA2 (0.50) CYP3A4TSHRATMTDP1L3MBTL1
SCHEMBL26207144 0.75 CYP3A4 (0.49) CYP3A4TSHRATMTDP1L3MBTL1
SCHEMBL26207140 0.75 CYP3A4 (0.49) CYP3A4TSHRATMTDP1L3MBTL1
SCHEMBL55328 0.74 CYP3A4 (0.64) CYP3A4TSHRATMTDP1L3MBTL1
SCHEMBL7218240 0.72 CYP3A4 (0.62) CYP3A4TSHRATMTDP1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230374329-A1 Copper Oxide Ink and Method for Producing Conductive Substrate Using Same, Product Containing Coating Film and Method for Producing Product Using Same, Method for Producing Product with Conductive Pattern, and Product with Conductive Pattern ASAHI KASEI KABUSHIKI KAISHA (JP) 2023-11-23 US disclosed
US-11760895-B2 Copper oxide ink and method for producing conductive substrate using same, product containing coating film and method for producing product using same, method for producing product with conductive pattern, and product with conductive pattern ASAHI KASEI KABUSHIKI KAISHA (JP) 2023-09-19 US disclosed