SCHEMBL2624951

SCHEMBL2624951

C[Si](C)(C)O[Si](C)(C)O[Si](C)(C)CCCOCCO

nearest known ligand 0.42

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.42
MEN1 O00255 2/20 0.38
KMT2A Q03164 2/20 0.38
THRB P10828 1/20 0.38
HTT P42858 1/20 0.38
MAPT P10636 1/20 0.38
MAPK1 P28482 1/20 0.37
ALDH1A1 P00352 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12754796 0.98 MEN1 (0.41) TSHRMEN1KMT2ATHRBHTT
SCHEMBL16169883 0.98 MEN1 (0.41) TSHRMEN1KMT2ATHRBHTT
SCHEMBL10301175 0.98 MEN1 (0.41) TSHRMEN1KMT2ATHRBHTT
SCHEMBL26921080 0.94 TSHR (0.46) TSHRMEN1KMT2ATHRBHTT
SCHEMBL63384 0.94 TSHR (0.46) TSHRMEN1KMT2ATHRBHTT
SCHEMBL19039345 0.94 TSHR (0.46) TSHRMEN1KMT2ATHRBHTT
SCHEMBL31348327 0.94 TSHR (0.46) TSHRMEN1KMT2ATHRBHTT
SCHEMBL20462801 0.93 TSHR (0.33) TSHRMEN1KMT2ATHRBHTT
SCHEMBL10301166 0.92 MEN1 (0.45) TSHRMEN1KMT2ATHRBHTT
SCHEMBL31187428 0.92 MEN1 (0.45) TSHRMEN1KMT2ATHRBHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6835458-B2 Additive fromulation: reaction product of carbinol functional siloxane surfactant and a carboxylic acid containing compound, particles selected from silica, alumina, borosilicate glass, quartz and zircon dispersed in siloxane PPG INDUSTRIES OHIO, INC. 2004-12-28 US claimed
US-20040209088-A1 COATING COMPOSITION HAVING IMPROVED MAR AND SCRATCH PROPERTIES PPG INDUSTRIES OHIO, INC. 2004-10-21 US claimed
US-20230295433-A1 SILICONE EMULSION COMPOSITION AND FIBER TREATMENT AGENT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-21 US disclosed
US-11655341-B2 Method for preparing a radical-polymerizable organopolysiloxane, a radiation-curable organopolysiloxane composition, and a release sheet SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-23 US disclosed
US-20180223181-A1 SILOXANE MONOMER, POLYMER THEREOF, COMPOSITION CONTAINING SAID POLYMER, AND ELECTRONIC ELEMENT DAINIPPON INK & CHEMICALS (JP) 2018-08-09 US disclosed
US-9958578-B2 Composition for manufacturing contact lenses and method for manufacturing contact lenses by using the same BENQ MATERIALS CORPORATION (TW) 2018-05-01 US disclosed
US-20180094178-A1 ORGANOPOLYSILOXANE EMULSION COMPOSITION FOR RELEASE PAPER OR RELEASE FILM, METHOD FOR PRODUCING SAME, AND RELEASE PAPER AND RELEASE FILM SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-04-05 US disclosed
US-20180024273-A1 COMPOSITION FOR MANUFACTURING CONTACT LENSES BENQ MATERIALS CORPORATION (TW) 2018-01-25 US disclosed
US-9804297-B2 Material for contact lenses, method for manufacturing contact lenses and contact lenses obtained thereby BENQ MATERIALS CORPORATION (TW) 2017-10-31 US disclosed
US-20170168197-A1 COMPOSITION FOR MANUFACTURING CONTACT LENSES AND METHOD FOR MANUFACTUGING CONTACT LENSES BY USING THE SAME BENQ MATERIALS CORPORATION (TW) 2017-06-15 US disclosed
US-20170038499-A1 COMPOSITION FOR MANUFACTURING CONTACT LENSES AND METHOD FOR MANUFACTURING CONTACT LENSES BY USING THE SAME BENQ MATERIALS CORPORATION (TW) 2017-02-09 US disclosed
US-20120001980-A1 INK JET INK, INK JET RECORDING METHOD, AND INK CARTRIDGE CANON KABUSHIKI KAISHA (JP) 2012-01-05 US disclosed
US-20110135905-A1 HIGH ENERGY RAY-CURABLE COMPOSITION DOW CORNING CORPORATION (US) 2011-06-09 US disclosed
US-20090088488-A1 Use of linear siloxanes and process for their preparation EVONIK DEGUSSA GMBH (DE) 2009-04-02 US disclosed
US-7345108-B2 Additives for imparting mar and scratch resistance and compositions comprising the same PPG INDUSTRIES OHIO, INC. (US) 2008-03-18 US disclosed
US-7268176-B2 Additives for imparting mar and scratch resistance and compositions comprising the same PPG INDUSTRIES OHIO, INC. (US) 2007-09-11 US disclosed
US-20060078748-A1 Novel additives for imparting Mar and scratch resistance and compositions comprising the same AMBROSE RONALD R 2006-04-13 US disclosed
US-6835458-B2 Additive fromulation: reaction product of carbinol functional siloxane surfactant and a carboxylic acid containing compound, particles selected from silica, alumina, borosilicate glass, quartz and zircon dispersed in siloxane PPG INDUSTRIES OHIO, INC. 2004-12-28 US disclosed
US-20040209088-A1 COATING COMPOSITION HAVING IMPROVED MAR AND SCRATCH PROPERTIES PPG INDUSTRIES OHIO, INC. 2004-10-21 US disclosed
US-20040116585-A1 Novel additives for imparting mar and scratch resistance and compositions comprising the same PPG INDUSTRIES OHIO, INC. 2004-06-17 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20180223181-A1 SILOXANE MONOMER, POLYMER THEREOF, COMPOSITION CONTAINING SAID POLYMER, AND ELECTRONIC ELEMENT ILK, LIMA1, EED TSHR 4881/4885MEN1 1017/4885KMT2A 478/4885
US-11655341-B2 Method for preparing a radical-polymerizable organopolysiloxane, a radiation-curable organopolysiloxane composition, and a release sheet MUS81, MSR1, H1-4 TSHR 147/4885MEN1 490/4885KMT2A 1452/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.