SCHEMBL2629341

SCHEMBL2629341

CCC(C)(CC)CC(C)C(=O)O

nearest known ligand 0.50

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
GABRR1 P24046 2/20 0.39
CYP1A2 P05177 1/20 0.39
ACE2 Q9BYF1 1/20 0.36
FOLH1 Q04609 2/20 0.34
NAALAD2 Q9Y3Q0 2/20 0.34
ENPEP Q07075 2/20 0.34
BLM P54132 1/20 0.34
TP53 P04637 1/20 0.33
CA2 P00918 1/20 0.32
MAPK1 P28482 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14793040 0.87 CYP1A2 (0.39) GABRR1CYP1A2ACE2FOLH1NAALAD2
SCHEMBL12951426 0.86 GABRR1 (0.33) GABRR1CYP1A2ACE2
SCHEMBL11527277 0.81 ACE2 (0.47) ACE2BLM
SCHEMBL28918211 0.81 GABRR1 (0.39) GABRR1CYP1A2ACE2FOLH1NAALAD2
SCHEMBL10047547 0.81 GABRR1 (0.39) GABRR1CYP1A2ACE2FOLH1NAALAD2
SCHEMBL17198278 0.79 GABRR1 (0.38) GABRR1CYP1A2ACE2FOLH1NAALAD2
SCHEMBL8259112 0.77 TSHR (0.39) GABRR1CYP1A2ACE2FOLH1NAALAD2
SCHEMBL10960652 0.77 GABRR1 (0.37) GABRR1CYP1A2ACE2FOLH1NAALAD2
SCHEMBL28678547 0.77 GABRR1 (0.37) GABRR1CYP1A2ACE2FOLH1NAALAD2
SCHEMBL13540752 0.77 GABRR1 (0.41) GABRR1CYP1A2ACE2FOLH1NAALAD2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4641061-A1 OIL-WELL METAL PIPE NIPPON STEEL CORPORATION (JP) 2025-10-29 EP claimed
WO-2024135464-A1 OIL-WELL METAL PIPE 日本製鉄株式会社 2024-06-27 WO claimed
EP-4641061-A1 OIL-WELL METAL PIPE NIPPON STEEL CORPORATION (JP) 2025-10-29 EP disclosed
WO-2024135464-A1 OIL-WELL METAL PIPE 日本製鉄株式会社 2024-06-27 WO disclosed
US-20120161296-A1 MULTIPLE PATTERNING USING IMPROVED PATTERNABLE LOW-k DIELECTRIC MATERIALS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-06-28 US disclosed
US-8163658-B2 Multiple patterning using improved patternable low-k dielectric materials INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-04-24 US disclosed
US-7919225-B2 Photopatternable dielectric materials for BEOL applications and methods for use INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2011-04-05 US disclosed
US-20110045387-A1 Method of Forming a Relief Pattern by E-Beam Lithography Using Chemical Amplification, and Derived Articles INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2011-02-24 US disclosed
US-20110042790-A1 MULTIPLE PATTERNING USING IMPROVED PATTERNABLE LOW-k DIELECTRIC MATERIALS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2011-02-24 US disclosed
US-20090291389-A1 PHOTOPATTERNABLE DIELECTRIC MATERIALS FOR BEOL APPLICATIONS AND METHODS FOR USE INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2009-11-26 US disclosed