SCHEMBL26312641

SCHEMBL26312641

O=C(OCC(F)(F)C(=O)O)c1ccc(I)c(O)c1

nearest known ligand 0.42

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ CA12 O43570 2/20 0.42
▸ CA1 P00915 2/20 0.42
▸ CA2 P00918 2/20 0.42
▸ CA7 P43166 2/20 0.42
▸ CA9 Q16790 2/20 0.42
▸ CA14 Q9ULX7 2/20 0.42
▸ ESR1 P03372 4/20 0.42
▸ SERPINE1 P05121 3/20 0.41
▸ ESR2 Q92731 1/20 0.40
▸ PTPN1 P18031 2/20 0.40
▸ MAPK1 P28482 1/20 0.38
▸ HIF1A Q16665 1/20 0.38
▸ HSD17B2 P37059 1/20 0.35
▸ XDH P47989 1/20 0.35
▸ L3MBTL1 Q9Y468 1/20 0.35
▸ KDM4E B2RXH2 1/20 0.34
▸ POLB P06746 1/20 0.34
▸ HDAC6 Q9UBN7 1/20 0.34
▸ JMJD6 Q6NYC1 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23559239 0.84 NOTUM (0.40) CA12CA1CA2CA7CA9
SCHEMBL26312649 0.83 NOTUM (0.44) CA12CA1CA2CA7CA9
SCHEMBL23559363 0.82 ESR1 (0.38) ESR1MAPK1HIF1AKDM4EPOLB
SCHEMBL23559292 0.81 ESR1 (0.53) CA12CA1CA2CA7CA9
SCHEMBL24776172 0.81 ESR1 (0.40) CA12CA1CA2CA7CA9
SCHEMBL23559299 0.80 MAPK1 (0.47) CA12CA1CA2CA7CA9
SCHEMBL23559361 0.80 MAPT (0.45) CA12CA1CA2CA7CA9
SCHEMBL24361312 0.79 ESR1 (0.53) CA12CA1CA2CA7CA9
SCHEMBL23559300 0.78 MAPK1 (0.46) ESR1ESR2MAPK1HIF1AJMJD6
SCHEMBL1313506 0.75 CA12 (0.72) CA12CA1CA2CA7CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230296981-A1 RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-21 — — US disclosed
US-20230296981-A1 RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-21 — — US disclosed
US-20230296980-A1 RESIST MATERIAL AND PATTERN FORMING METHOD SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-21 — — US disclosed
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