SCHEMBL23559361

SCHEMBL23559361

COc1ccc(C(=O)OCC(F)(F)C(=O)O)cc1I

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 2/20 0.45
▸ TSHR P16473 2/20 0.45
▸ HSD17B2 P37059 1/20 0.42
▸ KDM4E B2RXH2 1/20 0.40
▸ POLB P06746 1/20 0.40
▸ HDAC6 Q9UBN7 1/20 0.40
▸ RAB9A P51151 2/20 0.39
▸ SMN1; SMN2 Q16637 2/20 0.39
▸ NPC1 O15118 1/20 0.39
▸ ESR1 P03372 1/20 0.39
▸ MAPK1 P28482 2/20 0.39
▸ LMNA P02545 1/20 0.39
▸ HTT P42858 1/20 0.39
▸ CA12 O43570 1/20 0.39
▸ CA1 P00915 1/20 0.39
▸ CA2 P00918 1/20 0.39
▸ CA4 P22748 1/20 0.39
▸ CA6 P23280 1/20 0.39
▸ CA7 P43166 1/20 0.39
▸ TPMT P51580 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26312649 0.85 NOTUM (0.44) HSD17B2KDM4ERAB9ASMN1; SMN2NPC1
SCHEMBL23559363 0.81 ESR1 (0.38) TSHRKDM4EPOLBRAB9ANPC1
SCHEMBL23559239 0.81 NOTUM (0.40) HSD17B2KDM4ERAB9ASMN1; SMN2NPC1
SCHEMBL23559292 0.80 ESR1 (0.53) ESR1MAPK1CA12CA1CA2
SCHEMBL26312641 0.80 CA12 (0.42) HSD17B2KDM4EPOLBHDAC6ESR1
SCHEMBL5899536 0.79 HSD17B2 (0.65) MAPTTSHRHSD17B2KDM4EPOLB
SCHEMBL23559299 0.77 MAPK1 (0.47) POLBESR1MAPK1LMNACA12
SCHEMBL23559315 0.76 HTT (0.39) MAPTTSHRRAB9ANPC1MAPK1
SCHEMBL23559300 0.75 MAPK1 (0.46) MAPTRAB9ASMN1; SMN2NPC1ESR1
SCHEMBL1171023 0.75 MAPT (0.62) MAPTTSHRKDM4ERAB9ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230296981-A1 RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-21 — — US disclosed
US-20230296980-A1 RESIST MATERIAL AND PATTERN FORMING METHOD SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-21 — — US disclosed
US-20210188770-A1 ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-06-24 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20210188770-A1 ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SLC6A5, LIFR, SLC6A9 MAPT 2273/4885TSHR 3570/4885HSD17B2 918/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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