SCHEMBL23559363

SCHEMBL23559363

O=C(OCC(F)(F)C(=O)O)c1ccc(Cl)c(I)c1

nearest known ligand 0.38

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
▸ ESR1 P03372 1/20 0.38
▸ CYP1A2 P05177 1/20 0.38
▸ RAB9A P51151 1/20 0.38
▸ MAPK1 P28482 2/20 0.37
▸ HIF1A Q16665 1/20 0.37
▸ KMT2A Q03164 3/20 0.37
▸ MEN1 O00255 2/20 0.37
▸ NPC1 O15118 1/20 0.36
▸ SLC6A3 Q01959 1/20 0.36
▸ ALDH1A1 P00352 6/20 0.35
▸ KDM4E B2RXH2 4/20 0.35
▸ AGTR1 P30556 1/20 0.35
▸ HPGD P15428 3/20 0.34
▸ HSD17B10 Q99714 1/20 0.34
▸ POLB P06746 1/20 0.34
▸ TSHR P16473 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26312649 0.84 NOTUM (0.44) ESR1RAB9AMAPK1HIF1ANPC1
SCHEMBL26312641 0.82 CA12 (0.42) ESR1MAPK1HIF1AKDM4EPOLB
SCHEMBL23559361 0.81 MAPT (0.45) ESR1RAB9AMAPK1KMT2ANPC1
SCHEMBL23559239 0.81 NOTUM (0.40) ESR1RAB9AMAPK1HIF1ANPC1
SCHEMBL23559292 0.80 ESR1 (0.53) ESR1MAPK1HIF1A
SCHEMBL23559299 0.79 MAPK1 (0.47) ESR1MAPK1HIF1AKMT2AMEN1
SCHEMBL23559300 0.77 MAPK1 (0.46) ESR1RAB9AMAPK1HIF1AKMT2A
SCHEMBL8263186 0.76 CA12 (0.56) ESR1CYP1A2RAB9AKMT2AMEN1
SCHEMBL23559235 0.75 MAP2K1 (0.37) KMT2ASLC6A3TSHR
SCHEMBL24361312 0.74 ESR1 (0.53) ESR1CYP1A2RAB9AMAPK1HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230296981-A1 RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-21 — — US disclosed
US-20230296981-A1 RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-21 — — US disclosed
US-20230296980-A1 RESIST MATERIAL AND PATTERN FORMING METHOD SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-21 — — US disclosed
US-20210188770-A1 ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-06-24 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20210188770-A1 ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SLC6A5, LIFR, SLC6A9 ESR1 2832/4885CYP1A2 4076/4885RAB9A 1449/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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