SCHEMBL26312645

SCHEMBL26312645

O=C(OCC(F)(F)C(=O)O)c1ccc(I)cc1[N+](=O)[O-]

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ AR P10275 1/20 0.36
▸ NPC1 O15118 2/20 0.36
▸ RAB9A P51151 2/20 0.36
▸ L3MBTL1 Q9Y468 1/20 0.35
▸ MAPT P10636 2/20 0.35
▸ LMNA P02545 1/20 0.34
▸ HTT P42858 1/20 0.34
▸ HPD P32754 3/20 0.34
▸ GABRA1 P14867 1/20 0.34
▸ GABRG2 P18507 1/20 0.34
▸ GABRB3 P28472 1/20 0.34
▸ GABRA5 P31644 1/20 0.34
▸ GABRA3 P34903 1/20 0.34
▸ GABRA2 P47869 1/20 0.34
▸ GABRA4 P48169 1/20 0.34
▸ GABRA6 Q16445 1/20 0.34
▸ MEN1 O00255 1/20 0.33
▸ TTR P02766 1/20 0.33
▸ PPOX P50336 1/20 0.33
▸ KMT2A Q03164 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23559287 0.81 GABRA1 (0.38) L3MBTL1GABRA1GABRG2GABRB3GABRA5
SCHEMBL26312647 0.80 SERPINE1 (0.43) GABRA1GABRG2GABRB3GABRA5GABRA3
SCHEMBL23559235 0.79 MAP2K1 (0.37) L3MBTL1GABRA1GABRG2GABRB3GABRA5
SCHEMBL23559238 0.79 GABRA1 (0.39) ARL3MBTL1MAPTLMNAGABRA1
SCHEMBL23559357 0.78 CA12 (0.41) ARGABRA1GABRG2GABRB3GABRA5
SCHEMBL23559309 0.78 GABRA1 (0.37) L3MBTL1GABRA1GABRG2GABRB3GABRA5
SCHEMBL23559236 0.76 GABRA1 (0.39) LMNAGABRA1GABRG2GABRB3GABRA5
SCHEMBL26312664 0.75 SMN1; SMN2 (0.39) ARNPC1RAB9AMAPTLMNA
SCHEMBL1883708 0.74 SIRT6 (0.49) L3MBTL1LMNAHTTMEN1KMT2A
SCHEMBL1891804 0.73 DTYMK (0.53) MAPTLMNATDP1DTYMKCES2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230296981-A1 RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-21 — — US disclosed
US-20230296980-A1 RESIST MATERIAL AND PATTERN FORMING METHOD SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-21 — — US disclosed
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