SCHEMBL26312876

SCHEMBL26312876

C=C(C)C(=O)Oc1ccc(I)c(C(=O)OCCCCC(=O)OC(C)CS(=O)(=O)O)c1

nearest known ligand 0.32

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.32
APEX1 P27695 1/20 0.32
HTT P42858 1/20 0.32
TDP1 Q9NUW8 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26312875 0.97 POLB (0.31) POLBAPEX1HTTTDP1
SCHEMBL26312874 0.94 ELANE (0.30)
SCHEMBL26312950 0.85 TDP1 (0.36) POLBAPEX1HTTTDP1
SCHEMBL26312949 0.82 TDP1 (0.35) POLBAPEX1HTTTDP1
SCHEMBL26312948 0.78 ELANE (0.32) POLBAPEX1HTTTDP1
SCHEMBL26312853 0.74 ELANE (0.32)
SCHEMBL26312873 0.71
SCHEMBL26312946 0.69 ELANE (0.31)
SCHEMBL23963497 0.66 ELANE (0.49) POLBAPEX1HTTTDP1
SCHEMBL23963502 0.66 ELANE (0.40) POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230296981-A1 RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-21 US disclosed
US-20230296980-A1 RESIST MATERIAL AND PATTERN FORMING METHOD SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-21 US disclosed