SCHEMBL26312874

SCHEMBL26312874

C=C(C)C(=O)Oc1ccc(I)c(C(=O)OCCC(=O)OC(C)CS(=O)(=O)O)c1

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ELANE P08246 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26312875 0.94 POLB (0.31)
SCHEMBL26312876 0.94 POLB (0.32)
SCHEMBL26312948 0.84 ELANE (0.32) ELANE
SCHEMBL26312949 0.79 TDP1 (0.35) ELANE
SCHEMBL26312950 0.78 TDP1 (0.36) ELANE
SCHEMBL26312853 0.77 ELANE (0.32) ELANE
SCHEMBL26312873 0.73
SCHEMBL26312946 0.71 ELANE (0.31) ELANE
SCHEMBL26312951 0.69 ALDH1A1 (0.30)
SCHEMBL23963497 0.68 ELANE (0.49) ELANE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230296981-A1 RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-21 US disclosed
US-20230296980-A1 RESIST MATERIAL AND PATTERN FORMING METHOD SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-21 US disclosed