Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.35 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | APEX1 | P27695 | 1/20 | 0.35 |
| ▸ | HTT | P42858 | 1/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.32 |
| ▸ | ESR1 | P03372 | 2/20 | 0.31 |
| ▸ | ELANE | P08246 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | BRD4 | O60885 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26312950 | 0.97 | TDP1 (0.36) | TDP1POLBAPEX1HTTL3MBTL1 | |
| SCHEMBL26312948 | 0.94 | ELANE (0.32) | TDP1POLBAPEX1HTTELANE | |
| SCHEMBL26312875 | 0.85 | POLB (0.31) | TDP1POLBAPEX1HTT | |
| SCHEMBL26312876 | 0.82 | POLB (0.32) | TDP1POLBAPEX1HTT | |
| SCHEMBL26312874 | 0.79 | ELANE (0.30) | ELANE | |
| SCHEMBL26312951 | 0.77 | ALDH1A1 (0.30) | HTTKMT2A | |
| SCHEMBL26348282 | 0.74 | TSHR (0.47) | TDP1POLBAPEX1HTTL3MBTL1 | |
| SCHEMBL12376766 | 0.74 | ELANE (0.50) | TDP1POLBAPEX1HTTESR1 | |
| SCHEMBL26312929 | 0.73 | ESR1 (0.39) | TDP1POLBAPEX1HTTESR1 | |
| SCHEMBL12376762 | 0.73 | ELANE (0.42) | TDP1POLBAPEX1HTTESR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230296981-A1 | RESIST MATERIAL AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-21 | — | — | US | disclosed |
| US-20230296980-A1 | RESIST MATERIAL AND PATTERN FORMING METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-21 | — | — | US | disclosed |