SCHEMBL26312902

SCHEMBL26312902

C=C(C)c1ccc(C(=O)OCC(F)(F)S(=O)(=O)O)c(I)c1

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 3/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26312896 0.91 ESR1 (0.36) ESR1
SCHEMBL26312922 0.84 ESR1 (0.33) ESR1
SCHEMBL26312894 0.83 MEN1 (0.33)
SCHEMBL25455816 0.82 MAPK1 (0.39) ESR1
SCHEMBL26312933 0.82 ELANE (0.34)
SCHEMBL27262989 0.79 ESR1 (0.50) ESR1
SCHEMBL26312843 0.78 GABRA1 (0.30)
SCHEMBL26312901 0.77 ALDH1A1 (0.30)
SCHEMBL24776171 0.77 PTPN2 (0.39)
SCHEMBL26312936 0.77 TTR (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230296981-A1 RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-21 US disclosed
US-20230296980-A1 RESIST MATERIAL AND PATTERN FORMING METHOD SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-21 US disclosed