SCHEMBL26312925

SCHEMBL26312925

C=C(C)c1cc(I)c(OCCS(=O)(=O)O)c(I)c1

nearest known ligand 0.33

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
BPTF Q12830 1/20 0.32
ESR1 P03372 2/20 0.32
LMNA P02545 4/20 0.31
ALDH1A1 P00352 3/20 0.31
POLB P06746 2/20 0.31
RAB9A P51151 2/20 0.31
SMN1; SMN2 Q16637 2/20 0.31
MAPT P10636 2/20 0.31
ALOX15 P16050 2/20 0.31
NPC1 O15118 1/20 0.31
BRCA1 P38398 1/20 0.31
HTT P42858 1/20 0.31
KDM4E B2RXH2 1/20 0.31
GMNN O75496 1/20 0.31
PKM P14618 1/20 0.31
THPO P40225 1/20 0.31
MTOR P42345 1/20 0.31
RECQL P46063 1/20 0.31
BLM P54132 1/20 0.31
HIF1A Q16665 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26312907 0.81 THRA (0.40) THRBTHRA
SCHEMBL26312923 0.81
SCHEMBL19379579 0.80 ACP1 (0.35) LMNAALDH1A1POLBRAB9ASMN1; SMN2
SCHEMBL26312920 0.75
SCHEMBL26312959 0.73 POLB (0.33) LMNAALDH1A1POLBRAB9ASMN1; SMN2
SCHEMBL26312898 0.72 THRA (0.40) LMNAALDH1A1POLBRAB9ASMN1; SMN2
SCHEMBL26312845 0.70
SCHEMBL22991764 0.69 TPMT (0.52) BPTFLMNAMAPTTPMTMEN1
SCHEMBL19756120 0.69 PTGS1 (0.32) LMNABLM
SCHEMBL22991429 0.68 TPMT (0.40) BPTFESR1ALDH1A1POLBRAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230296981-A1 RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-21 US disclosed
US-20230296980-A1 RESIST MATERIAL AND PATTERN FORMING METHOD SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-21 US disclosed