SCHEMBL26312907

SCHEMBL26312907

C=C(C)c1ccc(OCCS(=O)(=O)O)c(I)c1

nearest known ligand 0.43

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
THRA P10827 1/20 0.40
THRB P10828 1/20 0.40
F2 P00734 2/20 0.39
PLAU P00749 1/20 0.39
ST14 Q9Y5Y6 1/20 0.39
KLK1 P06870 1/20 0.37
MGLL Q99685 1/20 0.33
PDE4B Q07343 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26312925 0.81 BPTF (0.32) THRATHRB
SCHEMBL26312897 0.76 S1PR3 (0.31)
SCHEMBL19756117 0.74 S1PR3 (0.31)
SCHEMBL19846321 0.72 HTR1A (0.41)
SCHEMBL26312898 0.72 THRA (0.40) THRATHRB
SCHEMBL26312847 0.72
SCHEMBL26312923 0.69
SCHEMBL2022996 0.69 APP (0.35) THRATHRBF2PLAUST14
SCHEMBL26312920 0.66
SCHEMBL566129 0.66 THRA (0.56) THRATHRBF2PLAUST14

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230296981-A1 RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-21 US disclosed
US-20230296980-A1 RESIST MATERIAL AND PATTERN FORMING METHOD SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-21 US disclosed