SCHEMBL26317205

SCHEMBL26317205

CCC(C)c1ccc(S(=O)(=O)Oc2ccccc2)cc1

nearest known ligand 0.46

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 4/20 0.46
ADAMTS4 O75173 1/20 0.46
ALDH1A1 P00352 4/20 0.45
TSHR P16473 1/20 0.45
L3MBTL1 Q9Y468 2/20 0.44
GAA P10253 1/20 0.44
MAPK1 P28482 1/20 0.44
MEN1 O00255 4/20 0.41
KMT2A Q03164 4/20 0.41
CASP1 P29466 1/20 0.41
HTT P42858 3/20 0.41
SMN1; SMN2 Q16637 2/20 0.41
LMNA P02545 2/20 0.41
SLC7A5 Q01650 1/20 0.41
MAPT P10636 2/20 0.40
NPC1 O15118 1/20 0.40
RAB9A P51151 1/20 0.40
KDM4E B2RXH2 1/20 0.40
EGFR P00533 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1825104 0.94 TDP1 (0.54) TDP1ADAMTS4ALDH1A1TSHRL3MBTL1
SCHEMBL1830292 0.86 MEN1 (0.53) ALDH1A1TSHRMEN1KMT2AHTT
SCHEMBL1825347 0.85 ALDH1A1 (0.48) TDP1ADAMTS4ALDH1A1L3MBTL1GAA
SCHEMBL14162936 0.83 TDP1 (0.56) TDP1ADAMTS4ALDH1A1L3MBTL1GAA
SCHEMBL27357814 0.82 TDP1 (0.54) TDP1ADAMTS4ALDH1A1L3MBTL1GAA
SCHEMBL1827082 0.82 TDP1 (0.51) TDP1ADAMTS4ALDH1A1L3MBTL1GAA
SCHEMBL20787587 0.82 MMP12 (0.43) TDP1ADAMTS4ALDH1A1TSHRL3MBTL1
SCHEMBL12624374 0.81 ALDH1A1 (0.41) TDP1ADAMTS4ALDH1A1TSHRL3MBTL1
SCHEMBL8501868 0.81 TDP1 (0.57) TDP1ADAMTS4ALDH1A1L3MBTL1GAA
SCHEMBL27815934 0.81 TDP1 (0.49) TDP1ADAMTS4ALDH1A1L3MBTL1GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230296983-A1 PHOTOSENSITIVE POLYMER, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE SAMSUNG ELECTRONICS CO., LTD. (KR) 2023-09-21 US disclosed