Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.38 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.36 |
| ▸ | TSHR | P16473 | 3/20 | 0.34 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | NAAA | Q02083 | 1/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
| ▸ | GPR35 | Q9HC97 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14649101 | 0.99 | THRB (0.39) | THRBCYP19A1TSHREPHX1ALDH1A1 | |
| SCHEMBL10217006 | 0.95 | TSHR (0.41) | THRBCYP19A1TSHREPHX1ALDH1A1 | |
| SCHEMBL26452148 | 0.95 | THRB (0.40) | THRBCYP19A1TSHREPHX1ALDH1A1 | |
| SCHEMBL9971300 | 0.94 | TSHR (0.43) | THRBCYP19A1TSHREPHX1ALDH1A1 | |
| SCHEMBL10171157 | 0.87 | THRB (0.40) | THRBCYP19A1TSHREPHX1ALDH1A1 | |
| SCHEMBL2625694 | 0.85 | THRB (0.38) | THRBCYP19A1TSHREPHX1ALDH1A1 | |
| SCHEMBL15452158 | 0.84 | CYP19A1 (0.39) | CYP19A1EPHX1NAAAHTTGPR35 | |
| SCHEMBL14648448 | 0.83 | THRB (0.39) | THRBCYP19A1TSHREPHX1ALDH1A1 | |
| SCHEMBL14654308 | 0.82 | NAAA (0.33) | EPHX1NAAA | |
| SCHEMBL16547519 | 0.82 | EPHX1 (0.35) | CYP19A1EPHX1NAAAHTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2021111913-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER, AND COMPOUND | JSR株式会社 | 2021-06-10 | — | — | WO | disclosed |
| US-9671693-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-06-06 | — | — | US | disclosed |
| US-9563124-B2 | Photoresist composition and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-02-07 | — | — | US | disclosed |
| US-9429841-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-08-30 | — | — | US | disclosed |
| US-9291893-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-03-22 | — | — | US | disclosed |
| US-9052591-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-06-09 | — | — | US | disclosed |
| US-8778594-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-07-15 | — | — | US | disclosed |
| US-8741543-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-06-03 | — | — | US | disclosed |
| US-8735047-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-05-27 | — | — | US | disclosed |
| US-8728707-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-05-20 | — | — | US | disclosed |
| US-20130022915-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20130022925-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20130022916-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20130022924-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20130022919-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20130022920-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20130022910-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20130022909-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20120156620-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-06-21 | — | — | US | disclosed |
| US-20120100483-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-04-26 | — | — | US | disclosed |