SCHEMBL26327985

SCHEMBL26327985

CC(=O)c1ccc(-c2ccc(CC=O)cc2)cc1

nearest known ligand 0.57

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 1/20 0.57
MAPT P10636 3/20 0.55
HSD17B1 P14061 2/20 0.55
SMN1; SMN2 Q16637 1/20 0.55
LMNA P02545 3/20 0.50
MMP12 P39900 1/20 0.49
MMP13 P45452 1/20 0.49
HSD17B10 Q99714 1/20 0.46
KIF11 P52732 1/20 0.45
XDH P47989 1/20 0.43
MMP2 P08253 1/20 0.42
MMP9 P14780 1/20 0.42
MMP8 P22894 1/20 0.42
PYCR1 P32322 1/20 0.42
MAOB P27338 1/20 0.42
HPGD P15428 2/20 0.42
L3MBTL1 Q9Y468 2/20 0.42
RAB9A P51151 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1260786 0.94 KMT2A (0.64) KMT2AMAPTHSD17B1SMN1; SMN2LMNA
SCHEMBL1759076 0.85 CYP2A6 (0.44) KMT2AMAPTHSD17B1SMN1; SMN2LMNA
SCHEMBL11777534 0.85 KMT2A (0.53) KMT2AMAPTHSD17B1SMN1; SMN2LMNA
SCHEMBL19817620 0.83 KMT2A (0.52) KMT2AMAPTHSD17B1SMN1; SMN2LMNA
SCHEMBL26327986 0.83 MAPT (0.68) KMT2AMAPTSMN1; SMN2LMNAMAOB
SCHEMBL4744025 0.83 MAPT (0.68) KMT2AMAPTSMN1; SMN2LMNAMAOB
Acetophenone SCHEMBL27534500 0.80 LMNA (0.60) KMT2AMAPTSMN1; SMN2LMNAMAOB
SCHEMBL197130 0.80 MAPT (0.80) KMT2AMAPTHSD17B1SMN1; SMN2LMNA
SCHEMBL3392101 0.80 HRH3 (0.43) LMNAMAOB
SCHEMBL11441494 0.80 MAPT (0.80) KMT2AMAPTHSD17B1SMN1; SMN2LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230287178-A1 Fluorinated Diamine or Salt Thereof, Method for Producing Fluorinated Diamine or Salt Thereof, Polyamide, Method for Producing Polyamide, Polyamide Solution, Cyclized Polyamide, Method for Producing Cyclized Polyamide, Insulation for High-Frequency Electronic Component, Method for Producing Insulation for High-Frequency Electronic Component, High-Frequency Electronic Component, High-Frequency Appliance, and Insulating Material for Producing High-Frequency Electronic Component CENTRAL GLASS COMPANY, LIMITED (JP) 2023-09-14 US disclosed