Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES1 | P23141 | 1/20 | 0.36 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.36 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.36 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.36 |
| ▸ | CES2 | O00748 | 1/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | CA1 | P00915 | 1/20 | 0.30 |
| ▸ | CA2 | P00918 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26327534 | 0.84 | CES1 (0.30) | CES1 | |
| SCHEMBL10016204 | 0.79 | — | — | |
| SCHEMBL2813689 | 0.77 | ADRB2 (0.38) | CES1ADRB2ADRB1ADRB3CES2 | |
| SCHEMBL17553325 | 0.77 | ADRB2 (0.38) | CES1ADRB2ADRB1ADRB3CES2 | |
| SCHEMBL1118363 | 0.76 | — | — | |
| SCHEMBL11767470 | 0.75 | ADRB2 (0.36) | ADRB2ADRB1ADRB3CYP3A4TSHR | |
| SCHEMBL27916215 | 0.75 | TSHR (0.37) | CES1ADRB2ADRB1ADRB3CYP3A4 | |
| Fluoride SCHEMBL27392156 | 0.74 | ADRB2 (0.39) | CES1ADRB2ADRB1ADRB3CES2 | |
| Hydrochloric Acid SCHEMBL28139236 | 0.74 | DNM1 (0.38) | TSHRCA1CA2 | |
| SCHEMBL28275241 | 0.74 | ADRB2 (0.39) | CES1ADRB2ADRB1ADRB3CES2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11768434-B2 | Polymer having a structure of polyamide, polyamide-imide, or polyimide, photosensitive resin composition, patterning process, photosensitive dry film, and protective film for electric and electronic parts | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-26 | — | — | US | disclosed |