SCHEMBL26330100

SCHEMBL26330100

CC(=O)OC1C2CC3CC1CC(C2)C3C

nearest known ligand 0.38

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.38
CHRM2 P08172 7/20 0.34
CHRM1 P11229 5/20 0.34
MEN1 O00255 2/20 0.34
CYP2D6 P10635 2/20 0.34
KMT2A Q03164 2/20 0.34
APOBEC3A P31941 1/20 0.33
CTDSP1 Q9GZU7 1/20 0.33
APOBEC3G Q9HC16 1/20 0.33
ALDH1A1 P00352 1/20 0.33
HSD11B1 P28845 1/20 0.32
CA9 Q16790 2/20 0.32
CA12 O43570 1/20 0.32
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32
CHRM4 P08173 4/20 0.32
CHRM3 P20309 4/20 0.32
CHRM5 P08912 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3753073 0.79 HSD11B1 (0.50) TSHRCHRM2CHRM1HSD11B1CHRM4
SCHEMBL4366002 0.75 ALDH1A1 (0.49) TSHRCHRM2CHRM1MEN1CYP2D6
SCHEMBL8765839 0.74 MEN1 (0.38) TSHRCHRM2CHRM1MEN1CYP2D6
SCHEMBL27108066 0.73
SCHEMBL27107975 0.73
SCHEMBL17298189 0.73 MEN1 (0.37) TSHRCHRM2CHRM1MEN1CYP2D6
SCHEMBL20169575 0.73 MEN1 (0.47) TSHRCHRM2CHRM1MEN1CYP2D6
SCHEMBL19116438 0.73 MEN1 (0.37) TSHRCHRM2CHRM1MEN1CYP2D6
SCHEMBL16546909 0.72 CA9 (0.40) TSHRCHRM2MEN1CYP2D6KMT2A
SCHEMBL16546870 0.72 CA9 (0.40) TSHRCHRM2MEN1CYP2D6KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230268178-A1 PROTECTIVE COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) 2023-08-24 US disclosed
US-20230268178-A1 PROTECTIVE COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) 2023-08-24 US disclosed