SCHEMBL23382744

SCHEMBL23382744

CCC(C)(C)Oc1ccc(C(=O)OC(C)(C)C(F)(F)C(=O)O)cc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ PPARA Q07869 6/20 0.40
▸ PPARG P37231 6/20 0.40
▸ FABP2 P12104 1/20 0.40
▸ SLC22A12 Q96S37 1/20 0.40
▸ ELANE P08246 1/20 0.40
▸ TP53 P04637 1/20 0.39
▸ HPGD P15428 1/20 0.39
▸ SMN1; SMN2 Q16637 1/20 0.39
▸ CYP1A2 P05177 2/20 0.38
▸ CYP2D6 P10635 2/20 0.38
▸ CYP2C19 P33261 2/20 0.38
▸ MEN1 O00255 1/20 0.38
▸ CYP3A4 P08684 1/20 0.38
▸ MAPT P10636 1/20 0.38
▸ KMT2A Q03164 1/20 0.38
▸ HDAC3 O15379 1/20 0.38
▸ HDAC1 Q13547 1/20 0.38
▸ HDAC2 Q92769 1/20 0.38
▸ ADORA3 P0DMS8 1/20 0.38
▸ EPHX2 P34913 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23382755 0.86 PPARA (0.43) PPARAPPARGFABP2SLC22A12ELANE
SCHEMBL23382754 0.86 ELANE (0.43) PPARAPPARGFABP2SLC22A12ELANE
SCHEMBL24361422 0.86 CYP1A2 (0.39) PPARAPPARGFABP2SLC22A12ELANE
SCHEMBL23382488 0.79 CA12 (0.46) PPARAPPARGFABP2SLC22A12ELANE
SCHEMBL24361152 0.79 TSHR (0.38) PPARAPPARGFABP2SLC22A12TP53
SCHEMBL23382685 0.78 SMN1; SMN2 (0.44) PPARAPPARGFABP2SLC22A12TP53
SCHEMBL24361180 0.78 CA12 (0.47) ELANESMN1; SMN2CYP1A2CYP2D6CYP2C19
SCHEMBL24360817 0.78 TSHR (0.49) ELANETP53CYP1A2CYP2D6CYP2C19
SCHEMBL23559559 0.77 TPMT (0.41) ELANECYP1A2CYP2D6CYP2C19TRPV1
SCHEMBL24360878 0.77 CES2 (0.47) PPARAPPARGTRPV1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11762287-B2 Onium salt compound, chemically amplified resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-19 — — US disclosed
US-11762287-B2 Onium salt compound, chemically amplified resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-19 — — US disclosed
US-20220127225-A1 ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-04-28 — — US disclosed
US-20210149301-A1 ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-05-20 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20220127225-A1 ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS CACNA1F, SLC6A5, IDUA PPARA 3475/4885PPARG 4167/4885FABP2 4253/4885
US-11762287-B2 Onium salt compound, chemically amplified resist composition and patterning process IDUA, SLC6A5, SLC6A9 PPARA 3433/4885PPARG 3927/4885FABP2 4460/4885
US-20210149301-A1 ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS IDUA, SLC6A5, SLC6A9 PPARA 3433/4885PPARG 3927/4885FABP2 4460/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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