SCHEMBL26343365

SCHEMBL26343365

Cc1ccc(COCC(=O)O)cc1[N+](=O)[O-]

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TSHR P16473 3/20 0.51
▸ CES2 O00748 1/20 0.47
▸ CES1 P23141 1/20 0.47
▸ ALDH1A1 P00352 6/20 0.44
▸ MAPT P10636 5/20 0.44
▸ CYP3A4 P08684 2/20 0.44
▸ RECQL P46063 1/20 0.44
▸ KMT2A Q03164 7/20 0.44
▸ MEN1 O00255 6/20 0.44
▸ SMN1; SMN2 Q16637 6/20 0.44
▸ NPC1 O15118 2/20 0.44
▸ RAB9A P51151 2/20 0.44
▸ LMNA P02545 2/20 0.44
▸ MAPK1 P28482 1/20 0.44
▸ HPGD P15428 3/20 0.44
▸ KDM4E B2RXH2 1/20 0.43
▸ AGTR1 P30556 1/20 0.43
▸ GRK6 P43250 1/20 0.43
▸ CYP1A2 P05177 1/20 0.41
▸ GAA P10253 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26343367 0.89 TSHR (0.51) TSHRALDH1A1MAPTKMT2AMEN1
SCHEMBL28762606 0.86 ALDH1A1 (0.53) TSHRCES2CES1ALDH1A1MAPT
SCHEMBL26343372 0.83 VCAM1 (0.49) ALDH1A1MAPTKMT2AMEN1SMN1; SMN2
SCHEMBL14661914 0.82 ALDH1A1 (0.49) TSHRCES2CES1ALDH1A1MAPT
SCHEMBL30641922 0.80 TSHR (0.58) TSHRCES2CES1ALDH1A1MAPT
SCHEMBL1492458 0.80 TSHR (0.58) TSHRCES2CES1ALDH1A1MAPT
SCHEMBL14662012 0.79 ALDH1A1 (0.51) TSHRCES2CES1ALDH1A1MAPT
SCHEMBL6251179 0.76 ALDH1A1 (0.43) TSHRALDH1A1MAPTCYP3A4RECQL
SCHEMBL7521309 0.76 ALDH1A1 (0.50) TSHRCES2CES1ALDH1A1MAPT
SCHEMBL13886116 0.76 MCL1 (0.46) ALDH1A1MAPTSMN1; SMN2HPGDKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240027902-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-25 — — US disclosed
US-20230359119-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-09 — — US disclosed
US-20230305394-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-28 — — US disclosed
US-20230305394-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-28 — — US disclosed
US-20230305393-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-28 — — US disclosed
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