SCHEMBL2634707

SCHEMBL2634707

CCCOS(=O)(=O)[O-].[H+]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Potassium Ion SCHEMBL10600320 0.94
SCHEMBL17456440 0.94 RECQL (0.60)
SCHEMBL6525696 0.94
Lithium Ion SCHEMBL17456536 0.94
SCHEMBL6862979 0.94 RECQL (0.60)
Water SCHEMBL1134659 0.92 RECQL (0.64)
Tetramethylammonium Ion SCHEMBL4623396 0.90 RECQL (0.56)
Methyl Alcohol SCHEMBL27946779 0.90 RECQL (0.56)
Lithium Ion SCHEMBL28616477 0.85 RECQL (0.52)
SCHEMBL2634750 0.84

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025087999-A1 ELECTRONIC DEVICE MANUFACTURING AQUEOUS SOLUTION, METHOD FOR PRODUCING RESIST PATTERN, AND METHOD FOR MANUFACTURING DEVICE MERCK PATENT GMBH (DE) 2025-05-01 WO disclosed
WO-2022220748-A1 SYNTHESIS OF POLYNUCLEOTIDE BOTTLEBRUSH POLYMER ILLUMINA SINGAPORE PTE. LTD. (SG) 2022-10-20 WO disclosed
US-9034557-B2 Chemically amplified positive photoresist composition FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2015-05-19 US disclosed
EP-2438486-A1 CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FujiFilm Electronic Materials USA, Inc. (US) 2012-04-11 EP disclosed
WO-2010141444-A1 CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2010-12-09 WO disclosed
US-20100304299-A1 CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2010-12-02 US disclosed
EP-0461043-A2 Enantiomer separation by transesterification SEPRACOR, INC. (US) 1991-12-11 EP disclosed
US-4769396-A Process for the production of cellular organic silicate products BLOUNT DAVID H (US) 1988-09-06 US disclosed
US-4695595-A Process for the production of cellular organic silicate products BLOUNT DAVID H 1987-09-22 US disclosed
US-4383078-A BASIFICATION OF PLANT MATERIAL WITH AN ALKALI HYDROXIDE AND REACTING WITH A POLYHYDROXY COMPOUND; POLYURETHANES; FOAMS BLOUNT DAVID H 1983-05-10 US disclosed
US-4361696-A COPOLYMERIZATION WITH VINYL MONOMER; PROTECTIVE COATINGS BLOUNT DAVID H 1982-11-30 US disclosed
US-4359548-A POLYESTERURETHANE COPOLYMERS BLOUNT DAVID H 1982-11-16 US disclosed
US-4354019-A MOLDING MATERIALS, ADHESIVES, COATINGS BLOUNT DAVID H 1982-10-12 US disclosed
US-4347345-A Process for the production of broken-down organic lignin-cellulose silicate polymers BLOUNT DAVID H 1982-08-31 US disclosed
US-4346192-A POLYURETHANE-POLYSILICATE INSULATING FOAMS BLOUNT DAVID H 1982-08-24 US disclosed
US-4346180-A POLYURETHANE FOAMS BLOUNT DAVID H 1982-08-24 US disclosed
US-4339366-A ALKALI METAL LIGNIN CELLULOSE POLYMER BLOUNT DAVID H 1982-07-13 US disclosed
US-4336340-A Process for the production of broken-down organic lignin-cellulose polymers BLOUNT DAVID H 1982-06-22 US disclosed
US-4321184-A FROM OXIDATED SILICON COMPOUNDS AND SUBSTITUTED ORGANIC COMPOUND IN PORESENCE OF AN ALKALI COMPOUND BLOUNT DAVID H 1982-03-23 US disclosed
US-4313857-A MOLDING POWDER AND COATINGS AND POLYURETHANE SILICATE PLASTIC FOAMS BLOUNT DAVID H 1982-02-02 US disclosed